NAND based NMOS NOR flash memory cell, a NAND based NMOS NOR flash memory array, and a method of forming a NAND based NMOS NOR flash memory array

ABSTRACT

A NOR flash nonvolatile memory device provides the memory cell size and a low current program process of a NAND flash nonvolatile memory device and the fast, asynchronous random access of a NOR flash nonvolatile memory device. The NOR flash nonvolatile memory device has an array of NOR flash nonvolatile memory circuits that includes charge retaining transistors serially connected in a NAND string such that at least one of the charge retaining transistors functions as a select gate transistor to prevent leakage current through the charge retaining transistors when the charge retaining transistors is not selected for reading. The topmost charge retaining transistor&#39;s drain is connected to a bit line parallel to the charge retaining transistors and the bottommost charge retaining transistor&#39;s source is connected to a source line and is parallel to the bit line. The charge retaining transistors are programmed and erased with a Fowler-Nordheim tunneling process.

This application claims priority under 35 U.S.C. §119 to U.S. Provisional Patent Application U.S. Provisional Patent Application Ser. No. 61/126,854, filed on May 7, 2008, which is herein incorporated by reference in its entirety.

This application claims priority under 35 U.S.C. §119 to U.S. Provisional Patent Application U.S. Provisional Patent Application Ser. No. 61/130,381, filed on May 30, 2008, which is herein incorporated by reference in its entirety.

This application claims priority under 35 U.S.C. §119 to U.S. Provisional Patent Application U.S. Provisional Patent Application Ser. No. 61/131,554, filed on Jun. 9, 2008, which is herein incorporated by reference in its entirety.

This application claims priority under 35 U.S.C. §119 to U.S. Provisional Patent Application U.S. Patent Application Ser. No. 61/132,122, filed on Jun. 16, 2008, assigned to the same assignee as the present invention, and incorporated herein by reference in its entirety.

This application claims priority under 35 U.S.C. §119 to U.S. Provisional Patent Application U.S. Patent Application Ser. No. 61/132,628, filed on Jun. 20, 2008, assigned to the same assignee as the present invention, and incorporated herein by reference in its entirety.

RELATED PATENT APPLICATIONS

U.S. patent application Ser. No. 12/455,337, filed on Jun. 1, 2009, assigned to the same assignee as the present invention, and incorporated herein by reference in its entirety.

U.S. patent application Ser. No. 12/455,936, filed on Jun. 9, 2009, assigned to the same assignee as the present invention, and incorporated herein by reference in its entirety.

U.S. patent application Ser. No. 12/456,354, filed on Jun. 16, 2009, assigned to the same assignee as the present invention, and incorporated herein by reference in its entirety.

U.S. patent application Ser. No. 12/456,744, filed on Jun. 22, 2009, assigned to the same assignee as the present invention, and incorporated herein by reference in its entirety.

BACKGROUND OF THE INVENTION

1. Field of the Invention

This invention relates generally to nonvolatile memory array structure and operation. More particularly, this invention relates to a NAND based NOR flash nonvolatile memory device structure and operation.

2. Description of Related Art

Nonvolatile memory is well known in the art. The different types of nonvolatile memory include Read-Only-Memory (ROM), Electrically Programmable Read Only Memory (EPROM), Electrically Erasable Programmable Read Only Memory (EEPROM), NOR Flash Memory, and NAND Flash Memory. In current applications such as personal digital assistants, cellular telephones, notebook and laptop computers, voice recorders, global positioning systems, etc., the Flash Memory has become one of the more popular types of Nonvolatile Memory. Flash Memory has the combined advantages of the high density, small silicon area, low cost and can be repeatedly programmed and erased with a single low-voltage power supply voltage source.

The Flash Memory structures known in the art employ a charge retaining mechanism such as a charge storage and a charge trapping. The charge storage mechanism, as with a floating gate nonvolatile memory, the charge representing digital data is stored on a floating gate of the device. The stored charge modifies the threshold voltage of the floating gate memory cell determine that digital data stored. In a charge trapping mechanism, as in a Silicon-Oxide-Nitride-Oxide-Silicon (SONOS) or Metal-Oxide-Nitride-Oxide-Silicon (MONOS) type cell, the charge is trapped in a charge trapping layer between two insulating layers. The charge trapping layer in the SONOS/MONOS devices has a relatively high dielectric constant (k) such Silicon Nitride (SiN_(x)).

A present day flash nonvolatile memory is divided into two major product categories such as the fast random-access, asynchronous NOR flash nonvolatile memory and the slower serial-access, synchronous NAND flash nonvolatile memory. NOR flash nonvolatile memory as presently designed is the high pin-count memory with multiple external address and data pins along with appropriate control signal pins. One disadvantage of NOR flash nonvolatile memory is as the density is doubled, the number of its required external pin count increases by one due to the adding of one more external address pin. In contrast, NAND flash nonvolatile memory has an advantage of having a smaller pin-count than NOR with no address input pins. As density increases, the NAND flash nonvolatile memory pin count is always kept constant. Both main-streamed NAND and NOR flash nonvolatile memory cell structures in production today use a one charge retaining (charge storage or charge trapping) transistor memory cell that stores one bit of data as charge or as it commonly referred to as a single-level program cell (SLC). They are respectively referred as one-bit/one transistor NAND cell or NOR cell, storing a single-level programmed data in the cell.

The NAND and NOR flash nonvolatile memory provide the advantage of in-system program and erase capabilities and have a specification for providing at least 100K endurance cycles. In addition, both single-chip NAND and NOR flash nonvolatile memory product can provide giga-byte density because their highly-scalable cell sizes. For instance, presently a one-bit/one transistor NAND cell size is kept at ˜4λ² (λ being a minimum feature size in a semiconductor process), while NOR cell size is ˜10λ². Furthermore, in addition to storing data as a single-level program cell having two voltage thresholds (Vt0 and Vt1), both one transistor NAND and NOR flash nonvolatile memory cells are able to store at least two bits per cell or two bits/one transistor with four multi-level threshold voltages (Vt0, Vt1, Vt2 and Vt03) in one physical cell.

Currently, the highest-density of a single-chip double polycrystalline silicon gate NAND flash nonvolatile memory chip is 63 Gb. In contrast, a double polycrystalline silicon gate NOR flash nonvolatile memory chip has a density of 2 Gb. The big gap between NAND and NOR flash nonvolatile memory density is a result of the superior scalability of NAND flash nonvolatile memory cell over a NOR flash nonvolatile memory. A NOR flash nonvolatile memory cell requires 5.0V drain-to-source (Vds) to maintain a high-current Channel-Hot-Electron (CHE) programming process. Alternately, a NAND flash nonvolatile memory cell requires 0.0V between the drain to source for a low-current Fowler-Nordheim channel tunneling program process. The above results in the one-bit/one transistor NAND flash nonvolatile memory cell size being only one half that of a one-bit/one transistor NOR flash nonvolatile memory cell. This permits a NAND flash nonvolatile memory device to be used in applications that require huge data storage. A NOR flash nonvolatile memory device is extensively used as a program-code storage memory which requires less data storage and requires fast and asynchronous random access.

A two-transistor NOR flash nonvolatile memory cell is formed of two NMOS transistors that is structured as a single-level program cell. The top transistor of the two-transistor NOR cell is a floating-gate transistor and the bottom transistor is a regular NMOS select transistor. Only the top 1T NAND cell has the capability to store data. With only one transistor of the two-transistor NOR flash nonvolatile memory cell retaining data, the overhead of this NOR flash nonvolatile memory cell is one select is transistor per NAND cell.

U.S. Pat. No. 7,263,003 (Edahiro, et al.) describes a two-transistor flash memory device using a replica cell array to control the precharge/discharge and sense amplifier circuits of the primary cell array.

U.S. Pat. No. 5,596,523 (Endoh, et al.) provides a NOR cell type EEPROM memory cell array section. Every two neighboring NOR cells are connected to a corresponding bit line at which the drain of one memory cell transistor and the source of the other cell transistor are connected together. The other source and drain of those cell transistors are coupled together to a source line. The Source line is provided with a select transistor.

U.S. Pat. No. 6,765,825 (Scott) describes a differential NOR memory cell having two floating gate transistors. Each of the drain terminals of the transistors is coupled to a corresponding differential bit line. The source terminal of both transistors are coupled to a common current source or sink. Each of the control gate terminals are coupled to a corresponding word line, which may be the same as or different than the corresponding word line that the other control terminal is connected to. The floating gate transistor may be five-terminal devices that include an additional well terminal. In that case, a different set of bit lines is used to program the EEPROM memory cell as are used to read the EEPROM memory cell. While the drain terminals are coupled to the differential read bit lines, each of the well terminals is coupled to a corresponding differential program bit line.

U.S. Patent Application 2006/0181925 (Specht, et al.) a nonvolatile memory cell arrangement where memory transistors are arranged in rows and columns. The source/drain terminals of the memory transistors of the first column are coupled to to conductor tracks of a different metallization plane than the first source/drain terminals of the memory transistors of the second column. In this way, it is now possible to arrange the memory transistors of adjacent columns in a memory arrangement closer to one another.

SUMMARY OF THE INVENTION

An object of this invention is to provide a NOR flash nonvolatile memory device that provides the memory cells size and a low current program process of a NAND flash nonvolatile memory device and the fast, asynchronous random access of a NOR flash nonvolatile memory device.

To accomplish at least this object, one embodiment of a NOR flash nonvolatile memory circuit includes a plurality of charge retaining transistors serially connected in a NAND string. A drain of a topmost charge storage transistor is connected to a bit line associated with the plurality of serially connected charge retaining transistors and a source of a bottommost charge storage transistor is connected to a source line associated with the plurality of charge retaining transistors. Each control gate of the plurality of charge retaining transistors on each row are commonly connected to a word line. The plurality of serially charge retaining transistors is formed within a well of a first conductivity type (a triple P-type well). The well of the first conductivity type is formed within a deep well of a second conductivity type (Deep N-type well). The deep well of the second conductivity type is form in a substrate of the first conductivity type (a P-type substrate).

The plurality of charge retaining transistors are programmed and erased with a Fowler-Nordheim tunneling process. To program a selected charge storage transistor of the plurality of charge retaining transistors as single-level program cell, a very high voltage level of from approximately +15.0V to approximately +20.0V is applied in incrementally increasing steps between the control gate of the selected charge storage transistor and a bulk region of the charge storage transistor. Those of the plurality of charge retaining transistors that are not selected are inhibited by an intermediate voltage level of less than +10.0V is applied between the control gate of the non-selected charge storage transistor and a bulk region of the charge storage transistor. The layout of the NOR flash memory circuit is such that the size of the NOR flash memory circuit is approximately four times the minimum feature size of the process technology for fabricating the NOR flash memory circuit.

To erase the selected charge storage transistor a very high positive voltage level of from approximately +15.0V to approximately +20.0V is applied between the a bulk region of the selected charge storage transistor and control gate of the charge storage transistor. Those of the plurality of charge retaining transistors that are not selected are inhibited by biasing the non-selected charge retaining transistors such that there is a approximately a 0.0V voltage level between the control gate and the bulk region of the non-selected storage transistors.

To read a selected charge storage transistor of the plurality of charge retaining transistors programmed as a single-level program cell, the source line is connected to a voltage follower sensing circuit. The gate and drain of the selected charge storage transistor is set to a voltage level of a power supply voltage source (VDD) that is approximately 1.8V or alternately approximately 3.0V. The gates of all non-selected charge retaining transistors within the plurality of charge retaining transistors is set to a first very high read voltage of greater than 6.0V. If the NOR flash memory circuit is not selected for reading, the control gates of the non-selected charge retaining transistors of the plurality of charge retaining transistors is set to the ground reference voltage to turn off the charge retaining transistors. The voltage follower sensing circuit is a comparator having a reference terminal connected to a reference voltage source. The reference voltage source is set to a voltage level of approximately 2.0V to distinguish between the threshold voltage level for a first logic level (0) and the threshold voltage levels of a second logic level (1).

To read a selected charge storage transistor of the plurality of charge retaining transistors programmed as a multi-level program cell, the source line is connected to a voltage follower sensing circuit. The gate and drain of the selected charge storage transistor is set to a moderately high voltage level that is approximately 4.0V. The gate of all non-selected charge retaining transistors within the plurality of charge retaining transistors is set to a second very high read voltage of greater than 7.0V. The voltage follower sensing circuit has a number of comparators equal to one less than the number of threshold voltage representing data stored within the charge storage transistor. Each of the comparators has a reference terminal connected to one of a group of reference voltage sources. The reference voltage sources is set to a voltage level between each of the voltage threshold to distinguish between the threshold voltage levels for each datum stored in the charge storage transistor.

In another embodiment, a NOR flash nonvolatile memory device includes an array of a plurality of NOR flash nonvolatile memory circuits arranged such that the charge retaining transistors of the NOR flash memory circuits are configured in rows and columns. Each NOR flash memory circuit includes a plurality of charge retaining transistors on a column connected serially in a NAND string. A drain of a topmost charge storage transistor of each NOR flash memory circuit is connected to a local bit line associated with the column on which each NOR flash memory circuit resides. A source of a bottommost charge storage transistor of each of the NOR flash memory circuits is connected to a local source line associated with the on which each NOR flash memory circuit. Each control gate of the charge retaining transistors on each row are commonly connected to a word line.

The NOR flash nonvolatile memory device includes a column voltage control circuit. The column voltage control circuit is connected to provide control signals to local bit lines and the source lines associated with each of the columns of charge retaining transistors. Each of the local bit lines is connected to one of a plurality of global bit lines through a bit line select transistor and each of the local source lines is connected to one of a plurality of global source lines through a source line select transistor. The global bit lines and the global source lines are connected to the column voltage control circuit to transfer the control signals to selected local bit lines and selected local source lines for reading, programming, and erasing selected charge retaining transistors within the NOR flash nonvolatile memory circuits.

The NOR flash nonvolatile memory device includes a row voltage control circuit. The row voltage control circuit is connected to provide control signals to word lines associated with each of the rows of charge retaining transistors and the gates of the local bit line select transistors and the source line select transistors connected to is each of the local bit lines. The row control circuit transfers the control signals to word lines for reading, programming, and erasing selected charge retaining transistors within the NOR flash nonvolatile memory circuits. The row voltage control circuit also transfers the select control signals to the selected bit line select transistors and the selected source line transistors to transfer the bit line and source line control signals from the column voltage control circuit to the selected local bit lines and selected local source lines.

The plurality of charge retaining transistors are programmed and erased with a Fowler-Nordheim tunneling process. To program selected charge retaining transistors of the plurality of charge retaining transistors as single-level program cell, the row voltage control circuit provides a very high program voltage level of from approximately +15.0V to approximately +20.0V to the word lines to be applied between the control gate of the selected charge storage transistor and a bulk region of the charge storage transistor. The row voltage control circuit provides an intermediate voltage level of less than +10.0V to be applied between the control gate of the non-selected charge storage transistor and a bulk region of the charge storage transistor to inhibit those of the plurality of charge retaining transistors that are not selected. The layout of the NOR flash memory circuit is such that the size of each of the NOR flash memory circuits is approximately four times the minimum feature size of the process technology for fabricating the NOR flash memory circuit.

To program a selected charge retaining transistor of the plurality of charge retaining transistors as a multi-level program cell, the row voltage control circuit applies a very high program voltage level to the word line of the selected charge retaining transistors incrementally increasing from approximately +15.0V to approximately +20.0V between the control gate of the selected charge retaining transistors and a bulk region to of the charge retaining transistors. The selected charge retaining transistors are read to verify the data between each incremental application of the very high voltage level until the correct voltage threshold is achieved. Those of the plurality of charge retaining transistors that are not selected are inhibited by an intermediate high voltage level of less than +10.0V is applied between the control gate of the non-selected charge storage is transistor and a bulk region of the charge storage transistor.

To erase selected charge retaining transistors, the row voltage control circuit applies a very high positive erase voltage level of from approximately +15.0V to approximately +20.0V between the bulk region of the selected charge storage transistor and a control gate of the selected charge storage transistor. Those of the plurality of charge retaining transistors that are not selected are inhibited by the row voltage control circuit applying biasing voltage level to the non-selected charge retaining transistors such that there is a approximately a 0.0V voltage level between the control gate and the bulk region of the non-selected storage transistors.

To read selected charge retaining transistors of the plurality of charge retaining transistors of a selected NOR flash memory circuit programmed as a single-level program cell, the source line is connected to a voltage follower sensing circuit within the column voltage control circuit. The row voltage control circuit sets the word line of the selected charge retaining transistors and thus the control gate to the power supply voltage source (VDD) that is approximately 1.8V or alternately approximately 3.0V. The row voltage control activates the local bit line select transistor to connect the global bit line and the local bit line associated with the selected charge retaining transistors. The column voltage control circuit then sets the global bit line and thus the local bit connected to the drain of the selected charge storage transistor to a voltage level of a power supply voltage source (VDD) that is approximately 1.8V or alternately approximately 3.0V. The row voltage control circuit sets the word line and the control gate of all non-selected charge retaining transistors within the plurality of charge retaining transistors of the selected NOR flash memory circuit is set to a first very high read voltage of greater than 6.0V. The voltage follower sensing circuit is a comparator within the column voltage control circuit having a reference terminal connected to a reference voltage source. The reference voltage source is set to a voltage level of approximately 2.0V to distinguish between the threshold voltage level for a first logic level (0) and the threshold voltage levels of a second logic level (1). The row voltage control circuit sets the word lines and thus the control gates of the non-selected charge retaining transistors of the plurality of charge retaining transistors of non-selected NOR flash memory circuit to the ground reference voltage to turn off the charge retaining transistors.

To read a selected charge storage transistor of the plurality of charge retaining transistors programmed as a multi-level program cell, the source line is connected to a voltage follower sensing circuit. The gate and drain of the selected charge storage transistor is set to a moderately high voltage level that is approximately 4.0V. The gate of all non-selected charge retaining transistors within the plurality of charge retaining transistors is set to a second very high read voltage of greater than 7.0V. The voltage follower sensing circuit has a number of comparators equal to one less than the number of threshold voltage representing data stored within the charge storage transistor. Each of the comparators has a reference terminal connected to one of a group of reference voltage sources. The reference voltage sources are set to a voltage level between each of the voltage threshold to distinguish between the threshold voltage levels for each datum stored in the charge storage transistor.

Further, in another embodiment, a method for forming a NOR flash nonvolatile memory device begins by providing a substrate onto which an array of a plurality of NOR flash nonvolatile memory circuits arranged such that the charge retaining transistors of the NOR flash memory circuits are configured in rows and columns. Each NOR flash memory circuit is formed by connecting a plurality of charge retaining transistors on a column serially in a NAND string. A drain of a topmost charge storage transistor of each NOR flash memory circuit is connected to a local bit line associated with the column on which each NOR flash memory circuit resides. A source of a bottommost charge storage transistor of each of the NOR flash memory circuits is connected to a local source line associated with the on which each NOR flash memory circuit. Each control gate of the charge retaining transistors on each row are commonly connected to a word line.

The method for forming a NOR flash nonvolatile memory device includes forming a column voltage control circuit. The column voltage control circuit is connected is to provide control signals to local bit lines and the source lines associated with each of the columns of charge retaining transistors. Each of the local bit lines is connected to one of a plurality of global bit lines through a bit line select transistor and each of the local source lines is connected to one of a plurality of global source lines through a source line select transistor. The global bit lines and the global source lines are connected to the column voltage control circuit to transfer the control signals to selected local bit lines and selected local source lines for reading, programming, and erasing selected charge retaining transistors within the NOR flash nonvolatile memory circuits.

The method for forming a NOR flash nonvolatile memory device includes forming a row voltage control circuit. The row voltage control circuit is connected to provide control signals to word lines associated with each of the rows of charge retaining transistors and the gates of the local bit line select transistors and the source line select transistors connected to each of the local bit lines. The row control circuit transfers the control signals to word lines for reading, programming, and erasing selected charge retaining transistors within the NOR flash nonvolatile memory circuits. The row voltage control circuit also transfers the select control signals to the selected bit line select transistors and the selected source line transistors to transfer the bit line and source line control signals from the column voltage control circuit to the selected local bit lines and selected local source lines.

The plurality of charge retaining transistors are programmed and erased with a Fowler-Nordheim tunneling process. To program selected charge retaining transistors of the plurality of charge retaining transistors as single-level program cell, the row voltage control circuit provides a very high voltage level of from approximately 15.0V to approximately 20.0V to the word lines to be applied between the control gate of the selected charge storage transistor and a bulk region of the charge storage transistor. The row voltage control circuit provides an intermediate voltage level of less than 10.0V to be applied between the control gate of the non-selected charge storage transistor and a bulk region of the charge storage transistor to inhibit those of the plurality of charge retaining transistors that are not selected. The layout of the NOR flash memory circuit is such that the size of each of the NOR flash memory circuits is approximately four times the minimum feature size of the process technology for fabricating the NOR flash memory circuit.

To program a selected charge retaining transistor of the plurality of charge retaining transistors as a multi-level program cell, the row voltage control circuit applies a very high voltage level to the word line of the selected charge retaining transistors incrementally from approximately 15.0V to approximately 20.0V between the control gate of the selected charge retaining transistors and a bulk region of the charge retaining transistors. The selected charge retaining transistors are read to verify the data between each incremental application of the very high voltage level until the correct voltage threshold is achieved. Those of the plurality of charge retaining transistors that are not selected are inhibited by an intermediate high voltage level of less than 10.0V is applied between the control gate of the non-selected charge storage transistor and a bulk region of the charge storage transistor.

To erase selected charge retaining transistors, the row voltage control circuit applies a very high positive erase voltage level of from approximately +15.0V to approximately +20.0V between the of the bulk region selected charge storage transistor and a control gate of the selected charge storage transistor. Those of the plurality of charge retaining transistors that are not selected are inhibited by the row voltage control circuit applying biasing voltage level to the non-selected charge retaining transistors such that there is a approximately a 0.0V voltage level between the control gate and the bulk region of the non-selected storage transistors.

To read selected charge retaining transistors of the plurality of charge retaining transistors of one selected NOR flash memory circuit programmed as a single-level program cell, the source line is connected to a voltage follower sensing circuit within the column voltage control circuit. The row voltage control circuit sets the word line of the selected charge retaining transistors and thus the control gate to the power supply voltage source (VDD) that is approximately 1.8V or alternately approximately 3.0V. The row voltage control activates the local bit line select transistor to connect the global bit line and the local bit line associated with the selected charge retaining transistors. The column voltage control circuit then sets the global bit line and thus the local bit line connected to the drain of the selected charge storage transistor to a voltage level of a power supply voltage source (VDD) that is approximately 1.8V or alternately approximately 3.0V. The row voltage control circuit sets the word line and the control gate of all non-selected charge retaining transistors within the plurality of charge retaining transistors of the selected NOR flash memory circuit is set to a first very high read voltage of greater than 6.0V. The row voltage control circuit sets the word lines and thus the control gates of the non-selected charge retaining transistors of the plurality of charge retaining transistors of non-selected NOR flash memory circuit to the ground reference voltage to turn off the charge retaining transistors. The voltage follower sensing circuit is a comparator within the column voltage control circuit having a reference terminal connected to a reference voltage source. The reference voltage source is set to a voltage level of approximately 2.0V to distinguish between the threshold voltage level for a first logic level (0) and the threshold voltage levels of a second logic level (1).

To read a selected charge storage transistor of the plurality of charge retaining transistors programmed as a multi-level program cell, the source line is connected to a voltage follower sensing circuit. The gate and drain of the selected charge storage transistor is set to a moderately high voltage level that is approximately 4.0V. The gate of all non-selected charge retaining transistors within the plurality of charge retaining transistors is set to a second very high read voltage of greater than 7.0V. The voltage follower sensing circuit has a number of comparators equal to one less than the number of threshold voltage representing data stored within the charge storage transistor. Each of the comparators has a reference terminal connected to one of a group of reference voltage sources. The reference voltage sources are set to a voltage level between each of the voltage threshold voltage levels to distinguish between the threshold voltage levels for each datum stored in the charge storage transistor.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 a is a top plan layout view of a single transistor floating-gate NMOS NAND flash cell.

FIG. 1 b is a cross sectional view of a single transistor floating-gate NMOS NAND flash cell.

FIG. 1 c is a schematic diagram of single transistor floating-gate NMOS NAND flash cell.

FIG. 1 d is a graph of two threshold voltage distributions of a single transistor floating-gate NMOS NAND flash cell having a negative erase level and a single positive program level.

FIG. 1 e is a graph of four threshold voltage distributions of a single transistor floating-gate NMOS NAND flash cell having a negative erase level and three positive program levels.

FIG. 2 a is a top plan layout view of a single transistor floating-gate NMOS NOR flash cell.

FIG. 2 b is a cross sectional view of a single transistor floating-gate NMOS NOR flash cell.

FIG. 2 c is a schematic diagram of single transistor floating-gate NMOS NOR flash cell.

FIG. 2 d is a graph of two threshold voltage distributions of a single transistor floating-gate NMOS NOR flash cell having a positive erase level and a single positive program level.

FIG. 2 e is a graph of four threshold voltage distributions of a single transistor floating-gate NMOS NOR flash cell having a positive erase level and three positive program levels.

FIG. 3 a is a top plan layout view of a two transistor floating-gate NMOS NOR flash cell with the drain contacts connected of the prior art.

FIG. 3 b is a cross sectional view of a two transistor floating-gate NMOS NOR flash cell of the prior art of FIG. 3 a

FIG. 3 c is a schematic diagram of two transistor floating-gate NMOS NOR flash cell of the prior art of FIG. 3 a.

FIG. 3 d is a graph of two threshold voltage distributions of a two transistor floating-gate NMOS NOR flash cell of the prior art having a positive erase level and a single positive program level.

FIG. 3 e is a graph of four threshold voltage distributions of a two transistor floating-gate NMOS NOR flash cell of the prior art having a positive erase level and three positive program levels.

FIG. 4 a is schematic diagram of an embodiment of two transistor floating-gate NMOS NOR flash cell embodying the principles of the present invention.

FIGS. 4 b-1, 4 b-2, 4 c-1 and 4 c-2 are top plan views and cross sectional cross sectional views of an embodiment of two transistor floating-gate NMOS NOR flash cell embodying the principles of the present invention.

FIGS. 5 a-5 e are top plan layout views illustrating wiring interconnection of an embodiment of a section of an array of two transistor floating-gate NMOS NOR flash cells embodying the principles of the present invention.

FIGS. 6 a-6 d are graphs of threshold voltage levels for a variety of various embodiments of the single transistor floating-gate NMOS NOR flash cell embodying the principles of the present invention.

FIGS. 7 a-7 d are graphs of threshold voltage levels of other implementations various embodiments of the two transistor floating-gate NMOS NOR flash cell embodying the principles of the present invention.

FIG. 8 is a schematic diagram of a NOR flash nonvolatile memory device incorporating various embodiments of the two transistor floating-gate NMOS NOR flash cell of the present invention.

FIG. 9 is a schematic diagram of row voltage control circuit of the NOR flash nonvolatile memory device of FIG. 8 embodying the principals of the present invention.

FIG. 10 is a schematic diagram of column voltage control circuit of the NOR flash nonvolatile memory device of FIG. 8 embodying the principals of the present invention.

FIG. 11 a is a schematic diagram of a voltage follower sensing circuit for a single level programming of various embodiments of the two transistor floating-gate NMOS NOR flash cell of the present invention.

FIG. 11 b is a table for the biasing voltages for reading the single level programming of various embodiments of the two transistor floating-gate NMOS NOR flash cell of the present invention.

FIG. 11 c is a schematic diagram of a voltage follower sensing circuit for multiple level programming of various embodiments of the two transistor floating-gate NMOS NOR flash cell of the present invention.

FIG. 11 d is a table for the biasing voltages for reading multiple level programming of various embodiments of the two transistor floating-gate NMOS NOR flash cell of the present invention.

FIGS. 12 a-12 e are tables of the erase biasing voltages for erasing various embodiments of the two transistor floating-gate NMOS NOR flash cell of the present invention.

FIGS. 13 a-13 b are tables of the program biasing voltages for programming various embodiments of the two transistor floating-gate NMOS NOR flash cell of the present invention.

FIG. 14 is flow chart for forming a NOR flash nonvolatile memory device embodying the principals of the present invention.

FIG. 15 is schematic diagram of an embodiment of a multiple transistor floating-gate NMOS NOR flash cell of the present invention.

DETAILED DESCRIPTION OF THE INVENTION

FIG. 1 a is a top plan view of a NMOS NAND flash floating-gate transistor 10. FIG. 1 b is a cross sectional view NMOS NAND flash floating-gate transistors 10. FIG. 1 c is the schematic symbol NMOS NAND flash floating-gate transistors 10. In a common structure of a NAND cell string of the NMOS NAND flash floating-gate transistors 10, the NMOS NAND flash floating-gate transistors 10 do not require a contact at either the drain diffusion region 15 or source diffusion region 20 node. In conventional NAND cell strings have a top select transistor connected to the topmost transistor and a bottom select transistor connected to the bottommost transistor. The drain of the top select transistor and the source of the bottommost transistor have contacts for connected to bit lines and source lines. This structure for a conventional NAND string enables the size of the NMOS NAND flash floating-gate transistors 10 to be the smallest of the nonvolatile memory structures.

The floating-gate type NMOS NAND flash cell 10 is formed in the top surface of a P-type substrate 40. An N-type material is diffused into the surface of the P-type substrate 40 to form a deep N-well 35. A P-type material is then diffused into the surface of the deep N-well 35 to form a P-well 30 (commonly referred to as a triple P-well). The N-type material is then diffused into the surface of a P-type well 30 to form the drain (D) 15 and the source (S) 20. A first polycrystalline silicon layer is formed above the bulk region of the P-type well 30 between the drain region 15 and the source region 20 to form the floating gate 45. A second polycrystalline silicon layer is formed over the floating gate 45 to create a control gate (G) 25 of the NMOS NAND flash floating-gate transistors 10. The gate length of the NMOS NAND flash floating-gate transistors 10 is the channel region in the bulk region of P-type well 30 between drain region 15 and the source region 20. The NMOS NAND flash floating-gate transistor's 10 channel width is determined by the width of the N-diffusion of the drain 15 and the source 20. The typical unit size of the NMOS NAND flash floating-gate transistors 10 is about 4λ² with 2λ in X-dimension and 2λ in Y-dimension. The dimension Lambda (A) is the minimum size of feature geometry achievable within a manufacturing process.

The floating-gate layer 45 stores electron charges to modify the threshold voltage of the NMOS NAND flash floating-gate transistors 10. In operation, the P-type substrate 40 is connected to a ground reference voltage source (GND). The deep N-well 35 is connected to the power supply voltage source (VDD). In present designs of NMOS NAND flash floating-gate transistors 10, the power supply voltage source is either 1.3V or 3.0V. The triple P-type well 30 is connected to the ground reference voltage in normal read operation.

In an array of NMOS NAND flash floating-gate transistors 10, the NMOS NAND flash floating-gate transistors 10 are arranged in rows and columns. The second polycrystalline silicon layer 25 that is the control gate of the NMOS NAND flash floating-gate transistors 10 is extended to form a word-line that connects to each of the NMOS NAND flash floating-gate transistors 10 on a row of an array.

A tunnel oxide 50 is formed on top of the channel region 32 between the drain region 15 and the source region 20 and the floating-gate 45. The thickness of the tunnel oxide 50 typically 100 Å. The tunnel oxide 50 is the layer through which the electron charges tunnel during the Fowler-Nordheim channel programming and Fowler-Nordheim channel erasing. In a traditional NAND operation, Fowler-Nordheim channel erasing expels stored electrons from the floating-gate 45 through the tunnel oxide 50 to cell's channel region 32 into the triple P-well 30.

FIG. 1 d is a graph of two threshold voltage distributions of a single transistor floating-gate NMOS NAND flash cell having a single program level and a is erase level. After an erase operation, there are fewer electron charges in the floating-gate 45 that result in lowering the threshold voltage of the NMOS NAND flash floating-gate transistors 10. Normally, the erased NMOS NAND flash floating-gate transistors 10 has its threshold voltage set to approximately −2.0V. In contrast, in Fowler-Nordheim channel programming, electrons are attracted to the floating-gate 45 so that threshold voltage of the NMOS NAND flash floating-gate transistors 10 is increased to a voltage level of approximately +2.0V. By convention, the erased voltage threshold (Vt0) value of approximately −2.0V is designated as a logical data value of “1” and the programmed voltage threshold (Vt1) of +2.0V is designated as a logical data value of “0”.

In an array, the Fowler-Nordheim channel erase process removes electron charges from the floating-gate and is generally performed collectively in unit of a page (512B) or a sector (64 KB) and the erased voltage threshold (Vt0) has a wider distribution because the nature of the process makes it more difficult to control the removal of the electrons. Alternately, a programming operation injects electrons into the floating-gate in a more controllable way and can be performed on bit-by-bit basis (one NMOS NAND flash floating-gate transistor 10 at a time through the a bit line connected to a drain 15) so that the programmed voltage threshold (Vt1) distribution is much smaller than erased voltage threshold (Vt0) and is controlled within 0.5V. Since each NAND cell stores two distinctive voltage threshold states with the erase voltage threshold state (Vt0) having a wide distribution and the programmed voltage threshold (Vt1) having one narrow distribution, the NMOS NAND flash floating-gate transistors 10 stores only one bit of a binary data and is referred to as a single level programmed or SLC, which stands for Single-Level-Cell. The NMOS NAND flash floating-gate transistors 10 that stores a single bit of data is referred to as a single-bit-one-transistor NMOS NAND flash floating-gate cell (1b1T).

FIG. 1 e is a graph of four threshold voltage distributions of a single transistor floating-gate NMOS NAND flash cell having one erase level and three program levels. It is known in the art that by varying the program conditions more than two threshold voltage levels can be created based on the quantity of charge placed on the floating-gate 45 of the NMOS NAND flash floating-gate transistors 10. This is commonly referred to multiple level programming of a NMOS NAND flash floating-gate cell or MLC, which stands for multi-level cell. In this example, there are four threshold voltage levels that can be programmed to the NMOS NAND flash floating-gate transistors 10. The most negative threshold voltage level Vt0 is the erased voltage level with a nominal value of −2.0V for storing a logical data value of “11”. The most negative threshold voltage level Vt0 has the widest distribution of the threshold voltage levels (Vt0, Vt1, Vt2 and Vt3) because it is the only one erase state, which is performed to remove the electron charges. The other three threshold voltage levels (Vt1, Vt2 and Vt3) have a more narrow distribution of the programmed states because they add the electrons onto the floating-gate in a more controlled fashion from the erase state. The three positive narrow programmed voltage threshold voltage levels are set to be sufficiently spaced apart to allow detection. In the present example, the first of the three voltage threshold levels Vt1 has a nominal value of approximately +1.0V for storing a logical data value “10”. The second of the three voltage threshold levels Vt2 has a nominal value of approximately +2.0V for storing a logical data value “01”. The third of the three voltage threshold level Vt3 has a nominal value of approximately +3.0V for storing a logical data value “00”. Since each NMOS NAND flash floating-gate transistor 10 stores four distinctive threshold voltage states, each NMOS NAND flash floating-gate transistor 10 stores two bits binary data and is referred to as a two-bit-one-transistor NMOS NAND flash cell (2b/1T).

The nominal values of threshold voltages (Vt0, Vt1, Vt2 and Vt3) of the NMOS NAND flash floating-gate transistors 10 may vary by more than 1.0V among different designs. The assignment of 2-bit data states for four threshold voltage states may also vary between NMOS NAND flash floating-gate cell designs. For example, to some NMOS NAND flash floating-gate cell designs assign the logical data value “01” to the first positive threshold voltage Vt1 and the logical data value “10” for the second positive threshold voltage state Vt2. Or the negative erased threshold voltage Vt0 may be assigned to the logical data value “00” and the third positive threshold voltage Vt3 may be assigned to the logical data value “11”.

FIG. 2 a is a top plan view of a NMOS NOR flash floating-gate transistor 110. FIG. 2 b is a cross sectional view NMOS NOR flash floating-gate transistors 110. FIG. 2 c is the schematic symbol NMOS NOR flash floating-gate transistors 110. The floating-gate type NMOS NOR flash cell 110 is formed within a triple P-well structure that is constructed into the top surface of a triple P-type substrate 130. An N-type material is diffused into the surface of the P-type substrate 140 to form a deep N-well 135. A P-type material is then diffused into the surface of the deep N-well 135 to form a P-well 130 (commonly referred to as a triple P-well). The N-type material is then diffused into the surface of a P-type well 130 to form the drain (D) 115 and the self-aligned source (S) 120. A first polycrystalline silicon layer is formed above the bulk region of the P-type well 130 between the drain region 115 and the source region 120 to form the floating gate 145. A second polycrystalline silicon layer is formed over the floating gate 145 to create a control gate (G) 125 of the NMOS NOR flash floating-gate transistors 110. The self-aligned source 120 is formed self-aligned between two adjacent second polycrystalline silicon layers of two control gates 125 of a pair of NMOS NOR flash floating-gate transistors 110. The self-aligned source 120 is commonly used in NMOS NOR flash floating-gate transistors 110 to reduce the source line pitch.

The gate length of the NMOS NOR flash floating-gate transistors 110 is the channel region 132 in the bulk region of P-type well 130 between drain region 115 and the source region 120. The NMOS NOR flash floating-gate transistor's 110 channel width is determined by the width of the N-diffusion of the drain 115 and the source 120. The typical unit size of the NMOS NOR flash floating-gate transistors 110 is about 10λ² with 2.5λ in the X-dimension and 4λ in the Y-dimension.

The floating-gate layer 145 stores electron charges to modify the threshold voltage of the NMOS NOR flash floating-gate transistors 110. In all operations, the P-type substrate 140 is connected to a ground reference voltage source (GND). The deep N-well 135 is connected to the power supply voltage source (VDD) in read and program operations but around +10V in the Fowler-Nordheim channel erase operation. In present designs of NMOS NOR flash floating-gate transistors 110, the power supply is voltage source is either 1.3V or 3.0V. The triple P-type well 130 is connected to the ground reference voltage in normal read and program operation but to the +10V during erase operation. In other words, during the Fowler-Nordheim channel erase operation, both the deep N-well 135 and the triple P-well 130 are biased with the same voltage of approximately +10V to avoid forward leakage current through the P/N junction through the deep N-well 135 and the triple P-well 130.

In an array of NMOS NOR flash floating-gate transistors 110, the NMOS NOR flash floating-gate transistors 110 are arranged in rows and columns. The second polycrystalline silicon layer 125 that is the control gate of the NMOS NOR flash floating-gate transistors 110 is extended to form a word-line that connects to each of the NMOS NOR flash floating-gate transistors 110 on a row of the array.

A tunnel oxide 150 is formed on top of the channel region 132 between the drain region 115 and the source region 120 and the floating-gate 145. The thickness of the tunnel oxide 150 typically 100 Å. The tunnel oxide 150 is the layer through which the electron charges pass during the high current channel-hot-electron programming and low current Fowler-Nordheim channel erasing. In a traditional NOR operation, Fowler-Nordheim edge erasing expels stored electrons from the floating-gate 145 through the tunnel oxide 150 to cell's channel region 132 into the triple P-type well 130.

After an erase operation, fewer electron charges are stored in the floating-gate 145 that results in a decrease in the NMOS NOR flash floating-gate transistor's 110 first threshold voltage level (Vt0) of less than approximately 2.5V. In contrast, in a channel-hot-electron program operation, electrons are attracted into floating-gate 145 so that the NMOS NOR flash floating-gate transistor's 110 second threshold voltage level (Vt1) is set to the voltage greater than approximately 4.0V. The distributions of the first threshold voltage level (Vt0) for an erased state with a wide distribution and the second threshold voltage level (Vt1) for a programmed state with a narrow distribution are set to be positive to avoid any false reading induced by the NMOS NOR flash floating-gate transistors 110 having a negative threshold voltage level.

FIG. 2 d is a graph of two threshold voltage distributions of a single transistor floating-gate NMOS NOR flash cell having a single program level. After an erase operation, there are fewer electron charges in the floating-gate 145 that result in lowering the threshold voltage of the NMOS NOR flash floating-gate transistors 10. Normally, the erased NMOS NOR flash floating-gate transistors 110 has a maximum value of its threshold voltage set to approximately +2.5V. In contrast, in channel-hot-electron-programming, electrons are attracted to the floating-gate 145 so that threshold voltage of the NMOS NOR flash floating-gate transistors 110 is increased to a minimum value voltage level of approximately +4.0V. By convention, the erased voltage threshold (Vt0) value of approximately +2.5V is designated as a logical data value of “1” and the programmed voltage threshold (Vt1) of +4.0V is designated as a logical data value of “0”. As in the NMOS NAND flash floating-gate transistors, the NMOS NOR flash floating-gate transistors 110 that stores a single bit of data is referred to as a single-bit-one-transistor NMOS NOR flash floating-gate cell (1b1T)

FIG. 2 e is a graph of four threshold voltage distributions of a single transistor floating-gate NMOS NOR flash cell having one erase level and three program levels. It is known in the art that by varying the program conditions more than two threshold voltage levels can be created based on the quantity of charge placed on the floating-gate 145 of the NMOS NOR flash floating-gate transistors 110. This is commonly referred to multiple level programming of a NMOS NOR flash floating-gate cell or multi-level programmed cell. In this example, there are four threshold voltage levels that can be programmed to the NMOS NOR flash floating-gate transistors 110. The least positive wide-distribution threshold voltage level Vt0 is the erased voltage level with a maximum value of +2.5V for storing a logical data value of “11”. The three positive narrow-distribution programmed voltage threshold voltage levels are set to be sufficiently spaced apart to allow accurate detection. In the present example, the first of the three voltage threshold levels Vt1 has a nominal value of approximately +3.5V for storing a logical data value “10”. The second of the three voltage threshold levels Vt2 has a nominal value of approximately +4.5V for storing a logical data value “01”. The third of the three voltage threshold level Vt3 has a nominal value of approximately +5.5V for storing a logical data value “00”. Since each NMOS NOR flash floating-gate transistor 110 stores four distinctive positive threshold voltage states, each NMOS NOR flash floating-gate transistor 110 stores two bits binary data and is referred to as a two-bit-one-transistor NMOS NOR flash cell (2b/1T).

The nominal values of threshold voltages Vt1 and Vt2 of the NMOS NOR flash floating-gate transistors 110 may vary by more than 1.0V among different designs. The nominal values of threshold voltages Vt0 and Vt3 can have a wider threshold voltage distribution. For example, the first threshold voltage Vt0 is may vary from approximately 1.0V to approximately 2.5V. The fourth threshold voltage Vt3 can have much wider distribution. It must have a voltage greater than approximately 4.5V to ensure that the NMOS NOR flash floating-gate transistors 110 is in a non-conduction state. The assigned designations of 2-bit data states for four threshold voltage states may also vary between NMOS NOR flash floating-gate cell designs as described above in the NMOS NAND flash floating-gate cell.

“Intel StrataFlash™ Memory Technology Overview”, Atwood, et al., Intel Technology Journal, Vol. 1, Issue 2, Q4 1997, found www.intel.com, Apr. 23, 2007, “Intel StrataFlash™ Memory Technology Development and Implementation”, Fazio, et al., Intel Technology Journal, Vol. 1, Issue 2, Q4 1997, found www.intel.com, Apr. 21, 2009, “ETOX™ Flash Memory Technology: Scaling and Integration Challenges”, Fazio, et al., Intel Technology Journal, Vol. 6, Issue 2, May 2002, found www.intel.com, Apr. 21, 2009, discuss a floating-gate ETOX™ flash memory transistor that is structured to form an NMOS NOR flash cell as described in FIGS. 3 a-3 e. FIG. 3 a is a top plan layout view of a two transistor floating-gate NMOS NOR flash cell. FIG. 3 b is a cross sectional to view of a two transistor floating-gate NMOS NOR flash cell. FIG. 3 c is a schematic diagram of two transistor floating-gate NMOS NOR flash cell. The two-transistor floating-gate type NMOS NOR flash cell 210 is formed in the top surface of a P-type substrate 240. An N-type material is then diffused into the surface of the P-type substrate 240 to form the drains (D) 215 a and 215 b of the two floating gate transistors is 205 a and 205 b and the self-aligned source (S) 220. The self-aligned source (S) 220 is shared by the two floating gate transistors 205 a and 205 b. A first polycrystalline silicon layer is formed over the bulk regions 230 a and 230 b between the drain regions 215 a and 215 b and the self-aligned source region 220 to form the floating gates 245 a and 245 b. A second polycrystalline silicon layer is formed over the floating gates 245 a and 245 b to create the control gates (G) 225 a and 225 b of the floating-gate transistors 210 a and 210 b. The self-aligned source 220 is formed self-aligned between two adjacent second polycrystalline silicon layers of two control gates 225 a and 225 b of a pair of two floating gate transistors 205 a and 205 b. The self-align source 220 is commonly used in NMOS NOR flash floating-gate transistors 210 to reduce the source line pitch.

The drain regions 215 a and 215 b each have a metal contact 250 a and 250 b. The two metal contacts 250 a and 250 b are connected to and shorted by a common metal bit line 255.

FIG. 3 d is a graph of two threshold voltage distributions of a two transistor floating-gate NMOS NOR flash cell 210 having a single program level. After an erase operation, there are fewer electron charges in the floating-gate 245 that result in lowering the threshold voltage of the two floating gate transistors 205 a and 205 b. In contrast, in channel-hot-electron-programming, electrons are attracted to the floating gates 245 a and 245 b so that threshold voltage of the two floating gate transistors 205 a and 205 b are increased. By convention, the erased voltage threshold (Vt0) is designated as a logical data value of “1” and the programmed voltage threshold (Vt1) is designated as a logical data value of “0”. The two floating gate transistors 205 a and 205 b that store a two bits of data is referred to as a two-bit-two-transistor NMOS NOR flash floating-gate cell (2b2T)

FIG. 3 e is a graph of four threshold voltage distributions of a two transistor to floating-gate NMOS NOR flash cell 210 having one erase level and three program levels. It is known in the art that by varying the program conditions more than two threshold voltage levels can be created based on the quantity of charge placed on the floating-gate 245 of the NMOS NOR flash floating-gate transistors 210. This is commonly referred to multiple level programming of a NMOS NOR flash floating-gate cell 210 or multi-level programmed cell. In this example, there are four threshold voltage levels that can be programmed to the two floating gate transistors 205 a and 205 b. The least positive threshold voltage level Vt0 is the erased voltage level for storing a logical data value of “11”. The three positive programmed voltage threshold voltage levels are set to be sufficiently spaced apart to allow detection. In the present example, the first of the three voltage threshold levels Vt1 stores a logical data value “10”. The second of the three voltage threshold levels Vt2 stores a logical data value “01”. The third of the three voltage threshold level Vt3 stores a logical data value “00”. Since each NMOS NOR flash floating-gate transistor 210 stores four distinctive threshold voltage states, each NMOS NOR flash floating-gate transistor 210 stores two bits binary data and is referred to as a two-bit-one-transistor NMOS NOR flash cell (2b/1T).

The nominal values of threshold voltages Vt1 and Vt2 of the NMOS NOR flash floating-gate transistors 210 may vary among different designs. The nominal values of threshold voltages Vt0 and Vt3 can have a wider threshold voltage distribution. The assigned designations of 2-bit data states for four threshold voltage states may also vary between NMOS NOR flash floating-gate cell designs as described above in the NMOS NAND flash floating-gate cell.

FIG. 4 a is the schematic symbol of a NMOS NOR flash memory cell 400 embodying the principles of the present invention. FIGS. 4 b-1 and 4 c-1 are top plan views of implementations of a NMOS NOR flash memory cell 400 embodying the principles of the present invention. FIGS. 4 b-2 and 4 c-2 are a cross sectional views of implementations of a NMOS NOR flash memory cell 400 embodying the principles of the present invention. The floating-gate type NMOS NOR flash cell 400 is formed in the top surface of a P-type substrate 440. An N-type material is diffused into the surface of the P-type substrate 440 to form a deep N-well 435. A P-type material is then diffused into the surface of the deep N-well 435 to form a P-well 430 (commonly referred to as a triple P-well). The N-type material is then diffused into the surface of a P-type well 430 to form the drain region (D) 415 of the NMOS NAND flash floating-gate transistor 405 a, the source region of the NMOS NAND flash floating-gate transistor 405 b and the self-aligned source/drain (S/D) 420. The source/drain 420 being the source region of the NMOS NAND flash floating-gate transistor 405 a and the drain of the NMOS NAND flash floating-gate transistors 405 b. A first polycrystalline silicon layer is formed above the bulk region of the P-type well 430 between the drain region 415 and the source region 420 NMOS NAND flash floating-gate transistor 405 a and the drain region 420 and the source region 422 of the NMOS NAND flash floating-gate transistor 405 b to form the floating gates 445 a and 445 b. A second polycrystalline silicon layer is formed over the floating gates 445 a and 445 b to create the control gates (G) 425 a and 425 b of the NMOS NAND flash floating-gate transistors 405 a and 405 b. The self-aligned source/drain region 420 is formed as self-aligned between the two adjacent second polycrystalline silicon layers of two control gates 425 a and 425 b of NMOS NAND flash floating-gate transistors 405 a and 405 b. The self-align source 420 is commonly used in the NMOS NAND flash floating-gate transistors 405 a and 405 b to reduce the source line pitch.

The gate length of the NMOS NAND flash floating-gate transistors 405 a and 405 b is the length of the channel regions 432 a and 432 b in the bulk region of P-type well 430 between drain region 415 and the source region 420 of the NMOS NAND flash floating-gate transistor 405 a and the drain region 420 and the source region 422 of the NMOS NAND flash floating-gate transistors 405 b. The NMOS NOR flash floating-gate transistors' 405 a and 405 b channel width is determined by the width of the N-diffusion of the drain region 415, the source region 422 and the source/drain region 420. The typical unit size of the two transistor NMOS NOR flash memory cell 400 is from approximately 12λ² to approximately 14λ². Therefore the effective size for a single bit NOR cell is approximately 6λ². The effective size (6λ²) of a single bit NOR cell is slightly larger than a NAND cell size of the prior art. However, the ^(effective) size of a single bit NOR cell is much smaller than the NOR cell size (10λ²) of the prior art for a semiconductor manufacturing process above 50 nm. The NOR cell structure of the prior size is projected to increase to 15λ² due to the scalability issues in semiconductor manufacturing process below 50 nm. The effective single bit/single transistor size of the NMOS NOR flash memory cell 400 remains constant an effective cell size of is approximately 6λ². The constant cell sized is a result of the scalability is identical to that of the NMOS NAND flash memory cell of the prior art.

The floating-gate layers 445 a and 445 b each respectively store electron charges to modify the threshold voltage of the NMOS NAND flash floating-gate transistors 405 a and 405 b. In all operations such as read, program and erase, the P-type substrate 440 is always connected to a ground reference voltage source (GND). The deep N-well 435 is connected to the power supply voltage source (VDD) in read and program operations but is connected to a voltage level of approximately +20V in a Fowler-Nordheim channel erase operation. In present designs of NMOS NOR flash memory cell 400, the power supply voltage source is either 1.8V or 3.0V. Like the deep N-well bias conditions, the triple P-type well 430 is connected to the ground reference voltage in normal read and program operations but is connected to around +20V in FN-channel erase operation.

In an array of NMOS NOR flash memory cell 400, the NMOS NAND flash floating-gate transistors 405 a and 405 b are arranged in rows and columns. The second polycrystalline silicon layer 425 that is the control gate of the NMOS NAND flash floating-gate transistors 410 is extended to form a word-line that connects to each of the NMOS NAND flash floating-gate transistors 410 on a row of the array.

A tunnel oxide is formed on top of the channel region 432 a and 432 b between the drain region 415 and the source region 420 of the NMOS NAND flash floating-gate transistor 405 a and the drain region 420 and the source region 422 of the NMOS NAND flash floating-gate transistor 405 b and beneath the floating-gates 445 a and 445 b. The thickness of the tunnel oxide typically 100 Å. The tunnel oxide is the layer through which the electron charges pass during the Fowler-Nordheim channel tunneling programming and erasing. In a traditional NOR operation, Fowler-Nordheim tunnel erasing expels stored electrons from the floating-gates 445 a and 445 b through the tunnel oxide to cell's channel regions 432 a and 432 b into the triple P-type substrate 430.

After an erase operation, fewer electron charges are stored in the floating-gates 445 a and 445 b that results in a decrease in a first threshold voltage level (Vt0) of the NMOS NAND flash floating-gate transistors 405 a and 405 b. In contrast, in a Fowler-Nordheim program operation, electrons are attracted into floating-gates 445 a and 445 b so that a second threshold voltage level (Vt1) of the NMOS NAND flash floating-gate transistors 405 a and 405 b is set to the relatively high voltage.

FIGS. 5 a-5 e are top plan layout views illustrating wiring interconnection of a section of an embodiment of an array of two transistor floating-gate NMOS NOR flash cells connected in series embodying the principles of the present invention. This section incorporates a matrix of four rows of the two transistor NMOS NOR flash memory cells 400 and twelve columns of the two transistor NMOS NOR flash memory cells 400 or eight rows of the NMOS NAND floating gate transistors 405 a and 405 b. Each of the NMOS NOR flash memory cells 400 have the N+ diffusions of the drain region 415, the source/drain region 420, and the source region 422 as described above in FIGS. 4 a, 4 b-1, 4 b-2, 4 c-1, and 4 c-2. The control gates 425 a and 425 b are incorporated within the word lines WL0 450 a and WL1 450 b. The bit lines 455 a and 455 b and the source lines 460 a and 460 b are formed as either first level metal (455 a and 460 b) or second level metal (455 b and 460 a) of FIGS. 4 b-2 and 4 c-2. The bit lines 455 a and 455 b are connected respectively through the vias 457 a and 457 b to the drain 415 of the NMOS NAND flash floating-gate transistors 405 a. The source lines 460 a and 460 b are connected respectively through the 462 a and 462 b to the source 422 of the NMOS NAND flash floating-gate transistor 405 b

In FIG. 5 b the connections of a local Metal1 bit lines to a local Metal2 bit lines and a Metal1 local source line to a local Metal2 source lines are connected through vias (Vial). FIG. 5 c shows the next layer of connections having Metal2 local bit lines connected to a local Metal3 bit lines and a Metal2 local source lines connected to a Metal3 local source lines through vias (VIA2). FIG. 5 d shows the next succeeding layer connections having Metal3 local bit lines connected to a Metal4 local bit lines and Metal3 local source lines connected to Metal4 local source lines through vias (VIA3). FIG. 5 e shows the next succeeding layer connections having Metal4 local bit lines connected to Metal5 local bit lines and Metal4 local source lines connected to Metal5 is local source lines through vias (VIA4). The matrix of NMOS NOR flash memory cells 400 of the 12 local bit lines 455 a and 455 b and the 12 local source lines 460 a and 460 b are successfully connected by using five metal layers only with an effective cell size of approximately 6λ². Each global bit line and each global source line is shared by two local bit lines 455 a and 455 b and local source lines 460 a and 460 b respectively.

The structure illustrated in FIGS. 5 a-5 e has 5 layers of metal wiring to produce a cell structure such that the effective size of a single bit transistor NOR cell size is approximately 6λ². The wiring pitch may be larger in the horizontal or x-direction or the NAND string may include three or more floating gate transistors to reduce the number of metal layers below five. This shows that there is a tradeoff between number of metal layer vs. number of NAND string versus the wiring pitch in the horizontal or x-direction. More number of NAND string and relax in x-direction would end up less metal layers.

FIGS. 6 a-6 d are graphs of threshold voltage levels of a variety of implementations of various embodiments of a single transistor of the two transistor floating-gate NMOS NAND flash cell of the present invention. FIG. 6 a illustrates the voltage thresholds levels for one implementation of programming and erasing of the NMOS NAND flash floating-gate transistors 405 a and 405 b of FIGS. 4 a, 4 b-1, 4 b-2, 4 c-1, and 4 c-2. In this implementation there is one programmed positive threshold voltage level (Vt1) with a narrow distribution representing a logical “0” datum and one programmed negative threshold voltage level (Vt0) also with a narrow distribution representing a logical “1” datum. Both Vt0 and Vt1 are programmed states, having preferable threshold voltage levels with narrow distributions. In the erasing of NMOS NAND flash floating-gate transistors 405 a and 405 b, a +20V is applied to the triple P-well 430 into which the NMOS NAND flash floating-gate transistors 405 a and 405 b are formed and a ground reference voltage level (0V) is applied to the selected control gate 425 a and 425 b on the selected NMOS NAND flash floating-gate transistors 405 a and 405 b to establish a 20V voltage drop between the selected control gate 425 a and 425 b and bulk 432 a and 432 b of the selected NMOS NAND flash floating-gate transistors 405 a and 405 b to establish a negative Fowler-Nordheim channel tunneling effect. Since the erase operation in an NOR flash nonvolatile memory array is conventionally performed in units of 64 KB on the selected NOR flash nonvolatile memory array block typically, the negative threshold voltage level (Vt0) is considered to be the collective erase state.

In a NAND flash nonvolatile memory array of the prior art, the threshold voltage level (Vt0) has a wide voltage distribution. Conventionally, the negative threshold voltage level (Vt0) has a range of approximately 2.0V, varying from −2.0V to about 0.0V. The threshold voltage level (Vt1) has a programmed voltage level of approximately +2.5V, varying from +2.0 to about +3.0V. The positive threshold voltage level (Vt1) does not need a narrow 0.5V distribution in circuit operation as long as the positive threshold voltage level (Vt1) is kept less than the pass voltage of 6.0V for the unselected word lines in the selected NAND flash nonvolatile memory array block during a page program operation.

Unlike the slow, synchronous, serial-read specification for a 512-bit page of the NAND flash nonvolatile memory array is about 20 μs, the targeted fast random, asynchronous read speed of NOR flash nonvolatile memory device is less than 100 ns. In view of the above speed requirements for a two-bit/two transistor of a NMOS NOR flash memory cell 400. With NMOS NAND flash floating-gate transistors 405 a and 405 b connected in series, the most preferred threshold voltage level distribution for both the negative threshold voltage level (Vt0) and the positive threshold voltage level (Vt1) is within approximately 0.5V. The negative threshold voltage level (Vt0) having a nominal voltage level of approximately −0.5V and the positive threshold voltage level (Vt1) having a nominal voltage level of approximately +3.0V. In order to achieve a narrow threshold voltage level distribution for the negative threshold voltage level (Vt0) to and positive threshold voltage level (Vt1), the negative threshold voltage level (Vt0) and positive threshold voltage level (Vt1) are achieved by using a bit-by-bit positive Fowler-Nordheim channel program process. The negative threshold voltage level (Vt0) state for the NMOS NAND flash floating-gate transistors 405 a and 405 b is performed in two step. The first step is performed by a negative Fowler-Nordheim channel collective erase in a page or a block with a wider negative threshold voltage level (Vt0) distribution and the second step positive bit-by-bit Fowler-Nordheim channel program to obtain a narrow negative threshold voltage level (Vt0). The positive threshold voltage level (Vt1) of the selected NMOS NAND flash floating-gate transistors 405 a and 405 b can be narrowed down in a single step by gradually increasing the program voltage at the selected control gate 425 a and 425 b incrementally from approximately +15.0V to approximately +20V or greater depending on the manufacturing integrated circuit process. Both negative threshold voltage level (Vt0) and positive threshold voltage level (Vt1) are the narrow programmed state having a distribution of approximately 0.5V for the NMOS NAND flash floating-gate transistors 405 a and 405 b.

FIG. 6 b illustrates the voltage thresholds levels for a second implementation of programming and erasing of NMOS NAND flash floating-gate transistors 405 a and 405 b of FIGS. 4 a, 4 b-1, 4 b-2, 4 c-1, and 4 c-2. In this single level cell (SLC) implementation, the first threshold voltage level (Vt0) and second threshold voltage level (Vt1) are all set to be positive with threshold voltage level distribution of approximately 0.5V. The positive first threshold voltage level (Vt0) is also done in 2-step with a first step of negative Fowler-Nordheim channel collective page-erase and followed by a second step of a positive Fowler-Nordheim channel bit-by-bit program as explained above for FIG. 6 a. The first threshold voltage level (Vt0) and second threshold voltage level (Vt1) are both programmed states as opposed to being an erased and program state.

The first threshold voltage level (Vt0) is set to be positive with a nominal value of 0.5V with narrow distribution of 0.5V or from approximately +0.75V to approximately +1.25V for storing a logical “1” datum. The second threshold voltage level (Vt1) is a positive state with a nominal value of 3.0V having the narrow distribution of from approximately +2.75V to approximately +3.25V for storing a logical “0” datum. In some embodiments of the NOR flash nonvolatile memory device a wider threshold voltage level distribution from +2.5V to +3.5V in some applications where a speed trade-off is required.

FIG. 6 c illustrates the voltage thresholds levels for still another implementation of programming and erasing of NMOS NAND flash floating-gate transistors 405 a and 405 b of FIGS. 4 a, 4 b-1, 4 b-2, 4 c-1, and 4 c-2. This implementation is for a multi-level cell (MLC) where all four threshold voltage levels (Vt0, Vt1, Vt2 and Vt3), regardless positive or negative, have a narrow distribution of approximately 0.5V. In this implementation the first threshold voltage level (VT0) is negative and is also a programmed state by using the two step write method as explained above. That means the first threshold voltage level (VT0) has a nominal threshold voltage level of approximately −0.5V and distribution varying from approximately −0.25V to approximately −0.75V for storing a logical “11” data. The second threshold voltage level (VT1) is the second data state stored in the NMOS NAND flash floating-gate transistors 405 a and 405 b and has a nominal voltage level of approximately +1.0 v. The second threshold voltage level (VT1) has a distribution that varies from approximately +0.75V to approximately +1.25V to store a logical “10” data. The third threshold voltage level (Vt2) is the third data state of the NMOS NAND flash floating-gate transistors 405 a and 405 b with a nominal voltage level of approximately +2.0V. The third threshold voltage level (Vt2) has a distribution that varies from approximately +1.75V to approximately +2.25V to store a logical “01” data. The fourth threshold voltage level (Vt3) is the fourth data state of the NMOS NAND flash floating-gate transistors 405 a and 405 b and has nominal voltage level of approximately +3.0V. The fourth threshold voltage level (Vt3) has a distribution that varies from approximately +2.75V to approximately +3.25V to store a logical “00” data.

Further, FIG. 6 d illustrates the voltage thresholds levels for another implementation of programming and erasing of NMOS flash floating-gate transistors 405 a and 405 b of FIGS. 4 a, 4 b-1, 4 b-2, 4 c-1, and 4 c-2. The first threshold voltage level (VT0), second threshold voltage level (VT1), third threshold voltage level (Vt2), and fourth threshold voltage level (Vt3) have relatively narrow distributions of the threshold voltage levels that are all positive. In this implementation, the first threshold voltage level (VT0) has a median voltage level of approximately +1.0V for storing “11”. The voltage distribution of the first threshold voltage level (VT0) is from +0.75V-+1.25V. The second threshold voltage level (VT1) has a median voltage level of approximately +2.0V to store a logical “10” data. The second threshold voltage level (VT1) has a distribution that varies from approximately +1.75V to approximately +2.25V. The third threshold voltage level (Vt2) has a median voltage level of approximately +3.0V to store a logical “01” data. The third threshold voltage level (Vt2) has a distribution that varies from approximately +2.75V to approximately +3.25V. The fourth threshold voltage level (Vt3) has a median voltage level of approximately 3.0V to store a logical “00” data. The fourth threshold voltage level (Vt3) has a distribution that varies from approximately +3.75V to approximately +4.25V.

FIGS. 7 a-7 d are graphs of threshold voltage levels of other implementations of various embodiments of the two transistor floating-gate NMOS NOR flash cell of the present invention. FIGS. 6 a-6 d illustrate the conventional designations for programming and erasing the NMOS NAND flash floating-gate transistors 405 a and 405 b of FIGS. 4 a, 4 b-1, 4 b-2, 4 c-1, and 4 c-2. In FIGS. 7 a-7 d illustrate an alternate process where the erase and program threshold voltage levels are reversed from those of FIGS. 6 a-6 d. In FIG. 7 a, the first threshold voltage levels (VT0) designating the logical “0” and the second threshold voltage level (VT1) logical “1” respectively now have nominal values of approximately −0.5V and approximately +3.0V. Similarly, in FIG. 7 b, the first threshold voltage level (VT0) designating the logical “0” and the second threshold voltage level (VT1) designating the logical “1” respectively now have nominal values of approximately +1.0V and approximately +3.0V. In FIG. 7 c, the first threshold voltage level (VT0) has a nominal threshold voltage level of approximately −0.5V to store the logical “00” data, the second threshold voltage level (VT1) has a nominal voltage level of approximately +1.0V to store a logical “10” data, the third threshold voltage level (Vt2) has a nominal voltage level of approximately +2.0V to store a logical “01” data, and the fourth threshold voltage level (Vt3) has nominal voltage level of approximately +3.0V to store a logical “00” data. In FIG. 7 d, the first threshold voltage level (VT0) has a nominal threshold voltage level of approximately +1.0V to store the logical “00” data, the second threshold voltage level (VT1) has a nominal voltage level of approximately +2.0V to store a logical “10” data, the third threshold voltage level (Vt2) has a nominal voltage level of approximately +3.0V to store a logical “01” data, and the fourth threshold voltage level (Vt3) has nominal voltage level of approximately +4.0V to store a logical “00” data.

The highest threshold voltage level or the fourth threshold voltage level (Vt3) of the multi-level cell state or second threshold voltage level (Vt1) of the single-level cell state is designated as the erased state. The first threshold voltage level (Vt0) in the single level cell and the first threshold voltage level (Vt0), second threshold voltage level (Vt1), and third threshold voltage level (Vt2) are the programmed states.

The erased threshold voltage level (Vt3 for a multi-level cell or Vt1 for single-level cell) is obtained by using the positive Fowler-Nordheim channel tunneling of a page in a NOR flash nonvolatile memory device that applies approximately +20.0V on the selected control gate 425 a and 425 b along with the ground reference voltage level (0.0V) in selected bulk regions of the selected NMOS NAND flash floating-gate transistors 405 a and 405 b of FIGS. 4 a, 4 b-1, 4 b-2, 4 c-1, and 4 c-2. It should be noted that the erased state of the fourth threshold voltage level (Vt3) of the multi-level cells of FIGS. 7 c and 7 d and the second threshold voltage level (VT1) of the single-level cell of FIGS. 7 a and 7 d are set to the voltage level for the Fowler-Nordheim tunneling collectively. Thus, the variation of the distribution of the threshold voltage levels is greater, since the erased state threshold voltage levels are verified to pass the minimum acceptable erased state threshold voltage level and the maximum erased state voltage level is a “don't-care” condition and does not need verification.

After an erase operation, those cells that are to be programmed to other logical data states are programmed by a bit-by-bit Fowler-Nordheim edge program process by applying a negative voltage of approximately −10.0V to the selected word lines of page of NOR flash nonvolatile memory device and applying approximately +5V to approximately +10V to the drains of the selected NMOS NAND flash floating-gate transistors 405 a and 405 b. The Sources of the selected NMOS NAND flash floating-gate transistors 405 a and 405 b are then disconnected to float. As described, the programming of the NMOS NAND flash floating-gate transistors 405 a and 405 b is a two step process, where the first step is erasing the selected segments of the NOR flash nonvolatile memory device positive Fowler-Nordheim channel operation. The second step is a bit-by-bit Fowler-Nordheim edge tunneling program process to trim the maximum threshold voltage levels to the desired voltage levels.

FIG. 8 is a schematic diagram of a NOR flash nonvolatile memory device 500 incorporating the various embodiments of the two transistor floating-gate NMOS NAND flash cell 510 of the present invention. The NOR flash nonvolatile memory device 500 includes an array 505 of two transistor floating-gate NMOS NOR flash cells 510 arranged in a matrix of rows and columns. Each of the two transistor floating-gate NMOS NOR flash cells 510 includes two NMOS NAND flash floating-gate transistors 515 a and 515 b. The two NMOS NAND flash floating-gate transistors 515 a and 515 b are structured and operate as the NMOS NAND flash floating-gate transistors 405 a and 405 b of FIGS. 4 a, 4 b-1, 4 b-2, 4 c-1, and 4 c-2. The drain of the floating-gate transistor 515 a is connected to one of the local bit lines 520 a, 520 b, . . . , 520 n−1, and 520 n. The source of the floating-gate transistor 515 b is connected of one of the local source lines 530 a, 530 b, . . . , 530 n−1, and 530 n. The source of the NMOS NAND flash floating-gate transistor 515 a is connected to the drain of the NMOS NOR flash floating-gate transistor 515 b.

The local bit lines 520 a, 520 b, . . . , 520 n−1, and 520 n associated with adjacent columns of the two transistor floating-gate NMOS NOR flash cells 510 are connected through the bit lines select transistors 560 a, . . . , 560 n to the global bit lines 525 a, . . . , 525 n. The local source lines 530 a, 530 b, . . . , 530 n−1, and 530 n associated with adjacent columns of the two transistor floating-gate NMOS NOR flash cells 510 are connected through the source lines select transistors 565 a, . . . , 565 n to the global source lines 540 a, . . . , 540 n. The global bit lines 525 a, . . . , 525 n and the global source lines 540 a, . . . , 540 n are connected to the column voltage control circuit 555. The column voltage control circuit 555 generates the appropriate voltage levels for selectively reading, programming, and erasing the two transistor floating-gate NMOS NOR flash cells 510.

Each of the control gates of the NMOS NAND flash floating-gate transistors 515 a and 515 b of the two transistor floating-gate NMOS NOR flash cells 510 on each row of the array 505 is connected to one of the word lines 545 a, 545 b, . . . , 545 m. The word lines 545 a, 545 b, . . . , 545 m are connected to the word line voltage control sub-circuit 552 in the row voltage control circuit 550.

Each of the gates of the bit lines select transistors 560 a, . . . , 560 n are connected to the bit line select control sub-circuit 551 within the row voltage control circuit 550 to provide the select signals for activation of the bit lines select transistors 560 a, . . . , 560 n to connect a selected local bit lines 520 a, 520 b, . . . , 520 n−1, and 520 n to its associated global bit line 525 a, . . . , 525 n. Each of the gates of the source lines select transistors 565 a, . . . , 565 n are connected to the source line select control circuit 553 within the row voltage control circuit 550 to connect the local source lines 530 a, 530 b, . . . , 530 n−1, and 530 n to their associated global source lines 540 a, . . . , 540 n.

Each of the gates of the source lines select transistors 565 a, . . . , 565 n are connected to the source line select control sub-circuit 553 within the row voltage control circuit 550 to provide the select signals for activation of the source lines select transistors 565 a, . . . , 565 n to connect a selected local source lines 530 a, 530 b, 530 n−1, and 530 n to its associated global source line 540 a, . . . , 540 n. Each of the gates of the source lines select transistors 565 a, . . . , 565 n are connected to the source line select control circuit 553 within the row voltage control circuit 550 to connect the local source lines 530 a, 530 b, . . . , 530 n−1, and 530 n to their associated global source lines 540 a, . . . , 540 n.

Refer now to FIG. 9 for a description of the row voltage control circuit 550. The row voltage control circuit 550 has a control decoder 605 that receives program timing and control signals 610, erase timing and control signals 615, and read timing and control signals 620. The control decoder 605 decodes the program timing and control signals 610, erase timing and control signals 615, and read timing and control signals 620 to establish the operation of the NOR flash nonvolatile memory device 500. The row voltage control circuit 550 has an address decoder 625 that receives and decodes an address signal 630 that provides the location of the selected floating-gate NMOS NOR flash cells 510 that are to be programmed, erased, or read.

The bit line select control sub-circuit 551 receives the decoded program, erase, and read timing and control signals from the control decoder 605 and the decoded addresses from the address decoder 625. The bit line select control sub-circuit 551 selects which of the bit line select signals 570 a, . . . , 570 b that activates the bit lines select transistors 560 a, . . . , 560 n that connects the local bit line 520 a, 520 b, 520 n−1, and 520 n to which the selected NOR flash nonvolatile memory devices 500 are connected to the associated global bit lines 525 a, . . . , 525 n.

The source line select control sub-circuit 553 receives the decoded program, erase, and read timing and control signals from the control decoder 605 and the decoded addresses from the address decoder 625. The source line select control sub-circuit 553 selects which of the source line select signals 575 a, 575 b that activates the source lines select transistors 565 a, . . . , 565 n that connects the local source lines 530 a, 530 b, . . . , 530 n−1, and 530 n to which the selected NOR flash nonvolatile memory device 500 is connected to the associated global source lines 540 a, . . . , 540 n.

The word line voltage control circuit 552 includes a program voltage generator 635, an erase voltage generator 640, a read voltage generator 645, and a row selector 650. The program voltage generator 635 has a pulsed incremental voltage generator 636 that provides a pulsed voltage that incrementally increases from approximately 15.0V to approximately +20.0V for more precisely setting the voltage threshold of the NMOS NAND flash floating-gate transistors 515 a and 515 b of FIG. 8. A positive program voltage generator 637 provides a voltage level of approximately +5.0V in one embodiment and approximately +2.5V in a second embodiment for inhibiting a disturb programming of the non-selected NMOS NAND flash floating-gate transistors 515 a and 515 b of FIG. 8. In the second embodiment the erased and programmed conditions are reversed as described in FIGS. 7 a-7 d. The negative program voltage generator 638 provides the necessary negative voltage level of approximately −10.0V for programming the NMOS NAND flash floating-gate transistors 515 a and 515 b of FIG. 8 according to the voltage distributions of FIGS. 7 a-7 d. The ground reference voltage source 639 is provided for isolating all the two NMOS NAND flash floating-gate transistors 515 a and 515 b of arrays within a NOR flash nonvolatile memory device 500 of FIG. 8 to prevent disturbing of the established programming of those NMOS NAND flash floating-gate transistors 515 a and 515 b of FIG. 8.

The erase voltage generator 640 has a positive erase voltage generator 642 to provide the necessary positive voltage for the erase of the first embodiment the NOR flash nonvolatile memory device 500 for the non-selected word lines to prevent disturbing the programming of the non-selected NMOS NAND flash floating-gate transistors 515 a and 515 b of FIG. 8. In the second embodiment, the positive erase voltage generator 642 provides the voltage level necessary for erasing the NMOS NAND flash floating-gate transistors 515 a and 515 b of FIG. 8. The erase voltage generator 640 has a negative erase voltage generator 643 for erasing the NMOS NAND flash floating-gate transistors 515 a and 515 b of FIG. 8 in the first embodiment. In the second embodiment the non-selected word lines are set to the ground reference voltage level 644.

The read voltage generator 645 has a first high read voltage generator 646 to provide the necessary read voltage VH to the control gates of the selected word line of the NMOS NAND flash floating-gate transistors 515 a and 515 b of FIG. 8 for reading single level cell data. The read voltage generator 645 has a second and a third high read voltage generator 647 and 648 to provide the read voltages VH1 and VH2 to the selected control gates of the NMOS NAND flash floating-gate transistors 515 a and 515 b of FIG. 8 for reading the multi-level cell data. The read voltage generator 645 provides a power supply voltage source generator 649 to the control gates of the NMOS NAND flash floating-gate transistors 515 a and 515 b of FIG. 8 for the single level cell data.

The row voltage control circuit 550 has a row selector 650 for transferring the program, erase, and read voltages from the program voltage generator 635, the erase voltage generator 640, and the read voltage generator 645 to the selected word lines 545 a, 545 b, . . . , 545 m.

Refer now to FIG. 10 for a description of the column voltage control circuit 555. The column voltage control circuit 555 has a control decoder 705 that receives program timing and control signals 710, erase timing and control signals 715, and read timing and control signals 720. The control decoder 705 decodes the program timing and control signals 710, erase timing and control signals 715, and read timing and control signals 720 to establish the operation of the NOR flash nonvolatile memory device 500. The column voltage control circuit 555 has an address decoder 725 that receives and decodes an address signal 730 that provides the locations of the selected floating-gate NMOS NAND flash cell 510 that are to be programmed, erased, or read.

The column voltage control circuit 555 includes a program voltage generator 735, an erase voltage generator 740; a read voltage generator 745, and a column selector 750. The program voltage generator 735 has a program voltage source 736 that provides a program inhibit voltage of approximately +10.0V to the drains and sources of the non-selected NMOS NAND flash floating-gate transistors 515 a and 515 b of FIG. 8 for the first embodiment to inhibit programming of the non-selected NMOS NAND flash floating-gate transistors 515 a and 515 b. The program voltage source 736 provides a voltage level of approximately +5.0V to the drain of the selected NMOS NAND flash floating-gate transistors 515 a and 515 b of FIG. 8 for the second embodiment during the program operation. A ground reference voltage level 737 is provided to drain and source of the selected NMOS NAND flash floating-gate transistors 515 a and 515 b of FIG. 8 during the program operation of the first embodiment. In certain of the non-selected NMOS NAND flash floating-gate transistors 515 a and 515 b of FIG. 8, the ground reference voltage level 737 is provided to further inhibit the programming of the non-selected NMOS NAND flash floating-gate transistors 515 a and 515 b.

The erase voltage generator 740 has a erase voltage source 742 to provide the necessary positive voltage for the erase of the first embodiment the NOR flash nonvolatile memory device 500. The sources and drains of the non-selected NMOS NAND flash floating-gate transistors 515 a and 515 b of FIG. 8 are set to the ground reference voltage level 743.

The read voltage generator 745 has a moderately high read voltage source 747 to provide the necessary read voltage VHD to the drains of the selected of the NMOS NAND flash floating-gate transistors 515 a and 515 b of FIG. 8 for reading multi-level cell data. The read voltage generator 745 provides a power supply voltage source generator 747 to the drain of the NMOS NAND flash floating-gate transistors 515 a and 515 b of FIG. 8 for the single level cell data.

The column voltage control circuit 550 has a column selector 750 for transferring the program, erase, and read voltages from the program voltage generator 735, the erase voltage generator 740, and the read voltage generator 745 to the selected bit lines 525 a, 525 b, . . . 525 m and source bit lines 540 a, 540 b, . . . , 540 m.

FIG. 11 a is a schematic diagram of a voltage follower sensing circuit for a single level programming of various embodiments of the NMOS NOR flash memory cell 400 of FIG. 4 a. The schematic diagram illustrates the two NMOS NAND flash floating-gate transistors 405 a and 405 b of a column of NMOS NAND flash floating-gate transistors. The drain 415 of the topmost of the NAND flash floating-gate transistors 405 a and 405 b is connected to the local bit line 805 that is then connected through the bit line select transistor 810 to the global bit line 815. The global bit line is connected to the column voltage control circuit 550 of FIG. 8. The gate of the bit line select transistor 810 is connected to the bit line select control sub-circuit 551 of FIG. 8 to receive the activation signal to activate the bit line select transistor 810 to connect the drain 415 of the topmost flash floating-gate transistor 405 a to the power supply voltage source VDD.

The source 422 of the bottommost flash floating-gate transistor 405 b is connected to the local source line 825. The local source line 825 is connected through to the source line select transistor 830 to the global bit line 835. The global bit line 835 is connected to the sense amplifier 755 of the column voltage control circuit 550 of FIG. 10. The sense amplifier has a comparator 850 with one terminal connected to the global bit line 835 and a second terminal is connected to a reference voltage source 855. The reference voltage source 855 has a voltage level that placed between the voltage levels is of the threshold voltage level representing the logical “1” data and the logical “0” data. The gate of the source line select transistor 830 is connected to the source line voltage control sub-circuit 553 of the row voltage control circuit 550 of FIG. 8. The source line voltage control sub-circuit 553 provides the voltage level necessary to activate the source line select transistor 830 to connect the local source line 825 and thus the source 422 of the NMOS NOR flash memory cell 400 to the global source line 835. When the floating-gate transistors 405 a and 405 b are activated, they act as a voltage follower with the voltage developed at the source line capacitance 845 being equal to the power supply voltage source less the programmed threshold voltage (Vs=VDD−Vt_(MSEL)) of the selected floating-gate transistor 405 a or 405 b. The non-selected floating-gate transistor 405 a or 405 b is driven such that it has a minimal voltage drop. Dependent upon the programmed threshold voltage level of the selected floating-gate transistor 405 a or 405 b, the output voltage of the comparator 850 will represent the logical “1” or logical “0” represented by the programmed threshold voltage.

Refer now to FIG. 11 b for a discussion of the biasing voltages for reading the single level programming of NMOS NOR flash memory cell 400. To read the SLC-storage of the topmost transistor of the flash floating-gate transistors 405 a and 405 b, the first word line WL0 450 a is set to the voltage level of the power supply voltage source VDD. Currently, the power supply voltage source VDD is either approximately +1.8V or approximately +3.0V. The second word line WL1 450 b is set to a relatively high read voltage level of greater than +6.0V to turn on the second floating-gate transistor 405 b. The drain of the topmost floating-gate transistor 405 a is set to the power supply voltage source VDD through the local bit line 805 and the global bit line 815. If the floating-gate transistor 405 a is programmed to have the first threshold voltage level Vt0 (from approximately −0.75V to approximately −0.25V), the voltage level VS0 at the source 422 of the bottommost floating-gate transistor 405 b and thus the first input of the comparator 850 is approximately the voltage level of the power supply voltage source VDD. If the floating-gate transistor 405 a is programmed to have the second threshold voltage level Vt1 (greater than +3.0V), the voltage level VS1 at the source 422 of the bottommost floating-gate transistor 405 b and thus the first input of the is comparator 850 is approximately the voltage level of the ground reference voltage (0.0V). The output of the comparator 850 then assumes the logic state indicated by the threshold voltage programmed to the topmost floating-gate transistor 405 a.

To read the SLC-storage of the bottommost transistor of the flash floating-gate transistors 405 a and 405 b, the second word line WL1 450 b is set to the voltage level of the power supply voltage source VDD. The first word line WL0 450 a is set to a relatively high read voltage level of greater than +6.0V to turn on the first floating-gate transistor 405 a. The drain of the bottommost floating-gate transistor 405 b is set to the power supply voltage source VDD through the topmost floating-gate transistor 405 a, the local bit line 805, and the global bit line 815. If the bottommost floating-gate transistor 405 b is programmed to have the first threshold voltage level Vt0 (from approximately −0.75V to approximately −0.25V), the voltage level VS0 at the source 422 of the bottommost floating-gate transistor 405 b and thus the first input of the comparator 850 is approximately the voltage level of the power supply voltage source VDD. If the floating-gate transistor 405 b is programmed to have the second threshold voltage level Vt1 (greater than +3.0V), the voltage level VS1 at the source 422 of the bottommost floating-gate transistor 405 b and thus the first input of the comparator 850 is approximately is approximately the voltage level of the ground reference voltage (0.0V) because the gate voltage of VDD of the floating-gate transistor 405 b is less than Vt1. As a result, bottommost floating-gate transistor 405 b is in a non-conductive state so that no voltage from the local bit line 805 would be passed to the local source line 830, thus the voltage level VS1=0V. The output of the comparator 850 then assumes the logic state indicated by the threshold voltage programmed to the bottommost floating-gate transistor 405 b.

If the NMOS NOR flash memory cell 400 is not selected for reading when another NMOS NOR flash memory cell 400 is selected in an array of NMOS NOR flash memory cells 400, the control gates of the non-selected flash floating-gate transistors 405 a and 405 b of non-selected NMOS NOR flash memory cells 400 are set to the ground reference voltage to turn off the charge retaining transistors.

FIG. 11 c is a schematic diagram of a voltage follower sensing circuit for a multi-level programming of various embodiments of the NMOS NOR flash memory cell 400 of FIG. 4 a. The schematic diagram illustrates the two NMOS NAND flash floating-gate transistors 405 a and 405 b of a column of NMOS NAND flash floating-gate transistors as described in FIG. 11 a with the exception that the global bit line is now set to a voltage level of first higher read voltage source V_(HD).

The global source line 835 in this embodiment is connected to the sense amplifier 755 of the column voltage control circuit 550 of FIG. 10. The sense amplifier 755 in this instance has three comparators 860, 870, and 880. Each of the three comparators 860, 870, and 880 has a first terminal connected to the global source line 835 and a second terminal is connected to a reference voltage source. The second terminal of the first comparator 860 is connected to the first reference voltage source 865, REFV0. The second terminal of the second comparator 870 is connected to the second reference voltage source 875, REFV1. The second terminal of the third comparator 880 is connected to the third reference voltage source 885, REFV2. The three reference voltage sources 865, 875, and 885 have a voltage level that placed between the voltage levels of the threshold voltages representing the logical values (“00”, “01”, “10”, “11”) of the data. The gate of the source line select transistor 830 is connected to the source line voltage control sub-circuit 553 of the row voltage control circuit 550 of FIG. 8. The source line voltage control sub-circuit 553 provides the voltage level necessary to activate the source line select transistor 830 to connect the local source line 825 and thus the source 422 of the NMOS NOR flash memory cell 400 to the global source line 835. When the floating-gate transistors 405 a and 405 b are activated, they act as a voltage follower with the voltage developed at the source line capacitance 845 being equal to the power supply voltage source less the programmed threshold voltage (Vs=VDD−VtMSEL) of the selected floating-gate transistor 405 a or 405 b. The non-selected floating-gate transistor 405 a or 405 b is driven such that it has a minimal voltage drop. Dependent upon the programmed threshold voltage level of the selected floating-gate transistor 405 a or 405 b, the output voltage of the comparator 850 will represent the logical values (“00”, “01”, “10”, “11”) of the data represented by the programmed threshold voltage. It should be noted that the structure as described is for is a two bit multi-level cell. It is keeping with the intent of this invention that any number of logical values for the data may be retained by the floating-gate transistors 405 a and 405 b.

Refer now to FIG. 11 d for a discussion of the biasing voltages for reading the multi-level programming of NMOS NOR flash memory cell 400. To read the topmost transistor of the flash floating-gate transistors 405 a and 405 b, the first word line WL0 450 a is set to the voltage level of a first higher read voltage source VH0. The first higher read voltage source VH0 is set to a voltage level of approximately 4.0V. The second word line WL1 450 b is set to a second higher read voltage level VH1 of greater than +7.0V to turn on the second floating-gate transistor 405 b. The drain of the topmost floating-gate transistor 405 a is set to third relatively higher voltage source VHD (>4.0V) through the local bit line 805 and the global bit line 815.

If the floating-gate transistor 405 a is programmed to have the first threshold voltage level Vt0 (from approximately −0.75 to approximately −0.25V), the voltage level VS0 at the source 422 of the bottommost floating-gate transistor 405 b and thus the first input of the comparator 850 is approximately the voltage level of the third higher read voltage source VHD. If the floating-gate transistor 405 a is programmed to have the second threshold voltage level Vt1 (approximately +1.0V), the voltage level VS1 at the source 422 of the bottommost floating-gate transistor 405 b and thus the first input of the comparator 850 is approximately the voltage level approximately 3.0V. If the floating-gate transistor 405 a is programmed to have the third threshold voltage level Vt2 (approximately 2.0V), the voltage level VS2 at the source 422 of the bottommost floating-gate transistor 405 b and thus the first input of the comparator 850 is approximately the voltage level of approximately 2.0V. If the floating-gate transistor 405 a is programmed to have the second threshold voltage level Vt3 (approximately to +3.0V), the voltage level VS3 at the source 422 of the bottommost floating-gate transistor 405 b and thus the first input of the comparator 850 is approximately the ground reference voltage (1.0V). The output of the comparator 850 then assumes the logic state indicated by the threshold voltage programmed to the topmost floating-gate transistor 405 a.

To read the multi-level programming of the bottommost transistor of the flash floating-gate transistors 405 a and 405 b, the second word line WL1 450 b is set to the voltage level of the VHD. The first word line WL0 450 a is set to a relatively high read voltage level of greater than +6.0V to turn on the first floating-gate transistor 405 a. The voltage level of the global source line, GSL, of the bottommost select transistor gated by SLG[n], is set through the bottommost floating-gate transistor 405 b, the topmost floating-gate transistor 405 a, the local bit line 805, the top select transistor, Msel, gated by BLG[n], and the global bit line 815. The gate voltage of the top and bottom select transistors have to be coupled to the high read voltage level plus the threshold level (VHD+Vt) to fully pass the full VHD voltage from GBL to GSL.

If the floating-gate transistor 405 b is programmed to have the first threshold voltage level Vt0 (from approximately −0.75 to approximately −0.25V), the voltage level VS0 at the source 422 of the bottommost floating-gate transistor 405 b and thus the first input of the comparator 850 is approximately the voltage level of the third higher read voltage source VHD. If the floating-gate transistor 405 b is programmed to have the second threshold voltage level Vt1 (approximately +1.0V), the voltage level VS1 at the source 422 of the bottommost floating-gate transistor 405 b and thus the first input of the comparator 850 is approximately the voltage level approximately 3.0V if VHD is 4.0V. If the floating-gate transistor 405 b is programmed to have the third threshold voltage level Vt2 (approximately 2.0V), the voltage level VS2 at the source 422 of the bottommost floating-gate transistor 405 b and thus the first input of the comparator 850 is approximately the voltage level of approximately 2.0V. If the floating-gate transistor 405 b is programmed to have the second threshold voltage level Vt3 (approximately +3.0V), the voltage level VS3 at the source 422 of the bottommost floating-gate transistor 405 b and thus the first input of the comparator 850 is approximately 1.0V. The output of the comparator 850 then assumes the logic state indicated by the threshold voltage programmed to the bottommost floating-gate transistor 405 b.

In both embodiments of the read operation of the NMOS NOR flash memory cell 400 of FIGS. 11 a and 11 c, the triple P-well diffusion 430 of FIGS. 4 b-2 and 4 c-2 is connected to the ground reference voltage level (0.0V). The deep n-well diffusion 435 of FIGS. 4 b-2 and 4 c-2 is connected to the power supply voltage source VDD.

If the NMOS NOR flash memory cell 400 is not selected for reading when another NMOS NOR flash memory cell 400 is selected in an array of NMOS NOR flash memory cells 400, the control gates of the non-selected flash floating-gate transistors 405 a and 405 b of non-selected NMOS NOR flash memory cells 400 are set to the ground reference voltage to turn off the charge retaining transistors.

FIGS. 12 a-12 e are tables of the erase biasing voltages for erasing the two transistor floating-gate NMOS NOR flash cell of FIGS. 4 a, 4 b-1, 4 b-2, 4 c-1, and 4 c-2. Referring now to FIGS. 12 b-12 e, the erase bias conditions in the four tables provide the erase conditions are to make the voltage drop between the bulk channel node 432 a and 432 b between the drains 415 and 420 and sources 420 and 422 and the control gate 425 a or 425 b of FIGS. 4 a, 4 b-1, 4 b-2, 4 c-1 and 4 c-2 is set to a voltage level of approximately +20.0V during the Fowler-Nordheim channel erase. In FIG. 12 a the selected word line 450 a or 450 b and thus the control gate 425 a or 425 b is set to a negative erase voltage level of approximately −10.0V and the drains 415 and 420, sources 420 and 422, the triple P-well diffusion 430, and the deep N-well diffusion 435 is set to a positive erase voltage level of approximately +10.0V. The unselected word lines 450 a or 450 b and thus the unselected control gates 425 a or 425 b are set to an inhibit erase voltage level of approximately +10.0V.

In FIG. 12 b, the negative erase voltage level is approximately −15.0V, the positive erase voltage level is approximately +5.0V, and the positive inhibit voltage level is approximately +5.0V. In FIG. 12 c the negative erase voltage level is −20.0V, the positive erase voltage level is approximately 0.0V and the positive inhibit voltage level is approximately 0.0V. In FIG. 12 d, the voltage levels are reverse and the negative erase voltage level is approximately 0.0V and the positive erase voltage is approximately +20.0V. Each of the voltage level as shown in FIGS. 12 a-12 d employ a Fowler-Nordheim channel tunneling phenomena to decrease the voltage threshold hold of the selected NMOS NAND flash floating-gate transistor 405 a or 405 b

For the non-selected two transistor floating-gate NMOS NAND flash cells of FIGS. 4 a, 4 b-1, 4 b-2, 4 c-1, and 4 c-2 not sharing the same triple P-well diffusion 430 and deep N-well diffusion 435, the unselected word line 450 a or 450 b and thus the control gate 425 a or 425 b, the drains 415 and 420, sources 420 and 422, and the triple P-well diffusion 430 are set to the voltage level of approximately the ground reference voltage level. The deep N-well diffusion 435 is set to the voltage level of the power supply voltage source VDD.

For the sub-arrays (often blocks of 512 Kb or 4 Kb) of an array of the floating-gate NMOS NAND flash cells, those sub-arrays that are not selected for erasing and have their deep N-well set to the positive erase voltage of +20V have their word lines, drains, sources, and triple P-well diffusion set to the ground reference voltage level. Those sub-arrays that are in different deep N-well diffusion that are not selected have their word lines, drains, sources, triple P-well, and the deep N-well diffusion set to the ground reference voltage level.

Refer now to FIG. 12 e for a discussion of the alternate erasing process where the erase and program threshold voltage levels are reversed. In this case, the selected word line 450 a or 450 b and thus the control gate 425 a or 425 b are set to a positive programming voltage level of approximately +20.0V. The control gate 425 a or 425 b, the drains 415 and 420, sources 420 and 422, and the triple P-well diffusion 430 are set to the ground reference voltage level (0.0V). The deep N-well 435 is set to the voltage level of the power supply voltage source. The sets the erased threshold voltage condition to the positive voltage level and the programmed threshold voltage condition to the more negative voltage level as shown in FIGS. 7 a-7 d.

FIGS. 13 a and 13 b are tables of the program biasing voltages for programming the two transistor floating-gate NMOS NAND flash cell of FIGS. 4 a, 4 b-1, 4 b-2, 4 c-1, and 4 c-2. Prior to programming selected NMOS NAND flash floating-gate transistor 405 a or 405 b of two transistor floating-gate NMOS NAND flash cell of FIGS. 4 a, 4 b-1, 4 b-2, 4 c-1, and 4 c-2, the cells must be erased as described above. In an is array of the two transistor floating-gate NMOS NAND flash cells as shown in FIG. 8 the erase operation is performed for a page or block of the cells.

For the programming of the selected NMOS NAND flash floating-gate transistor 405 a or 405 b of FIGS. 4 a, 4 b-1, 4 b-2, 4 c-1, and 4 c-2, the word line selected word line 450 a or 450 b and thus the control gate 425 a or 425 b are set to a positive program voltage level of from approximately +15.0V to approximately +20.0V. The drains 415 and 420 and sources 420 and 422 and the bulk 432 a and 432 b through the triple P-well 430 are set to the ground reference voltage level (0.0V). The non-selected NMOS NAND flash floating-gate transistor 405 a or 405 b have the word line 450 a or 450 b connected to their control gate 425 a or 425 b set to an intermediate inhibit program voltage level of less than approximately +5.0V. In the non-selected floating-gate NMOS NAND flash cells within an array as shown in FIG. 8 that are on the selected word line 450 a or 450 b have their drains and source set to a positive program inhibit voltage level of from approximately +7.0V to approximately +10.0V. Those non-selected floating-gate NMOS NAND flash cells within an array as shown in FIG. 8 that share the bit lines 455 a and 455 b and source lines 460 a and 460 b with those that have the positive inhibit voltage level, have their word lines 450 a and 450 b set to the intermediate inhibit program voltage of +5.0V. Those non-selected floating-gate NMOS NOR flash cells that do not have their word lines 450 a and 450 b or bit lines 455 a and 455 b or source lines 460 a and 460 b connected to the positive program voltage or the positive program inhibit voltage are set to the ground reference voltage level (0.0V). As it is well known that the higher the positive program voltage applied to the control gate 425 a or 425 b, the higher the threshold voltage Vt after programming. In order to maintain an accurate threshold voltage control over the NMOS NAND flash cell during the program operation, the gate voltage is applied with an initial positive program voltage level of approximately +15.0V to approximately +16.0V. The positive program voltage level is then iteratively increased in small increments with each pulse of the iteration programming process. The above programming voltage levels apply for programming either the single-level cell or the multi-level cell with the threshold voltage levels shown in FIGS. 6 a-6 d.

Gradually increasing the negative gate voltage in small increments along with the preferable fixed optimized drain voltage and the floating source of the selected program cells in the selected block. This is the iterative program and program verification steps. For example, the drain (local BL) voltage is coupled to a fixed +5V along with the local SL in floating. The preferable biased conditions are shown in the table of FIG. 8 to program the selected cell of M0. The gate voltage of −10V is applied to WL0 of the selected cell of M0. It may start from −5V and is then gradually ramped to −10V. Thus In other words, the cell's Vt can be accurately controlled the value that falls within the desired value.

Refer now to FIG. 13 b for a description of the programming voltage levels of the reversed program and erase conditions as shown in FIGS. 7 a-7 b. In this example the selected NMOS NAND flash floating-gate transistor 405 a or 405 b has the selected word lines 450 a or 450 b set to a negative program voltage level of approximately −10.0V. The drain 415 and 420 is gradually ramped to an intermediate positive drain voltage level of approximately +5.0V. The sources 420 is disconnected to be floating. The selected NMOS NOR flash cell is iteratively programmed and the verified to achieve the accurate cell threshold voltage after the program operation. In this case the program condition is based the Fowler-Nordheim edge tunneling program process. The popular FN-edge program is used to reduce the selected cells' Vt after program. But the final Vt after FN-edge program of the selected program cells has to be maintained in positive value to avoid the false read due to the BL leakage through the unselected cells in the selected block. The FN-edge happens to those edges between Drain node and Gate node of the selected NAND cells of the selected block of the present invention.

Alternately, the negative program voltage level may be gradually incremented from approximately −7.0V to approximately −10.0 v. The intermediate positive drain voltage is now fixed at approximately +5.0V. In this case the incremental increase in the negative program voltage level is approximately 0.3V in each iteration step.

The non-selected NMOS NAND flash floating-gate transistor 405 a or 405 b are inhibited from being programmed by setting the non-selected word lines 450 a or 450 b to a positive inhibit voltage level of approximately +2.5V. The drains 415 of the non-selected NMOS NAND flash floating-gate transistor 405 a or 405 b and the triple P-well diffusion 430 are set to ground reference voltage level (0.0V) and the deep N-well diffusion 435 is set to the voltage level of the power supply voltage source VDD.

The electrons in the floating gate of the selected floating-gate NMOS NOR flash cell are expelled from the floating gates 445 a or 445 b. As a result, the threshold voltage level of the selected floating-gate NMOS NOR flash cell can be well controlled very accurately for the threshold voltage levels for the single-level cell and the multi-level cell.

FIG. 14 is flow chart for forming a NOR flash nonvolatile memory device embodying the principals of the present invention. An array of floating gate transistors are formed (Box 905) on a substrate. The floating gate transistors are arranged in a matrix of rows and columns. At least two of the column adjacent floating gate transistors are connected (Box 910) in series to form a NAND series string of NOR memory cells. The drain of the topmost floating gate transistor of the NAND based NOR flash memory cells on each column is connected (Box 915) to an associated bit line. The source of the bottommost floating gate transistor of the NAND based NOR flash memory cells on each column is connected (Box 920) to an associated source line.

The local bit line is connected (Box 925) through a top bit line select transistor to an associated global bit line. The source of the top bit line select transistor is connected to the local bit line and the drain of the top bit line select transistor is connected to the global bit line. The local source line is connected (Box 930) through a bottom source line select transistor to an associated global source line. The source of the bottom source line select transistor is connected to the local source line and the drain of the bottom source line select transistor is connected to the global source line.

A bit line gate select control line is connected (Box 935) to the gate of the top bit line select transistor and a source line gate select control line is connected (Box 940) to the gate of the bottom source line select transistor. On each row of the array of NAND based NOR flash memory cells, the control gate of each floating gate transistor is connected (Box 945) to an associated word line. Each of the word lines for each of the rows of floating gate transistors is connected (Box 950) to a word line voltage controller to provide the necessary biasing voltages for the program, erase, and read operations of the array of NAND based NOR flash memory cells. Each of the bit line select control lines is connected (Box 955) to a bit line select controller for controlling the activation of the bit line select transistors to selectively connect a selected local bit line to a global bit line. Similarly, each of the source line select control lines is connected (Box 960) to a source line select controller for controlling the activation of the source line select transistors to selectively connect a selected local source line to a global source line.

Each of the global bit lines and the column bit lines is connected (Box 965) to a column voltage controller. The word line voltage controller and the column voltage controller provide the appropriate voltages to NAND based NOR flash memory cells as described above for programming, erasing, and reading of the NAND based NOR flash memory cells.

FIG. 15 is schematic diagram of an embodiment of a NAND based multiple transistor floating-gate NMOS NOR flash memory array. In the NAND based NMOS NOR flash memory array of FIG. 8 each of the floating-gate NMOS NOR flash cells has two floating gate transistors. In FIG. 15, each of the floating-gate NMOS NOR flash cells 1005 has at least two of the floating gate transistors 1010 a, 1010 b, . . . , 1010 n serially connected as described in FIG. 8 for the embodiment of two serial transistors. The drain of the topmost floating gate transistor 1010 a is connected to the local bit line 1015 and the source of the bottommost floating gate transistor 1010 n is connected to the local source line 1020. Each of the word lines 1025 a, 1025 b, . . . , 1025 n is connected to the control gate of the floating gate transistors 1010 a, 1010 b, . . . , 1010 n on the associated row of the NAND based NMOS NOR flash memory array. The number of bits stored in the floating-gate NMOS NOR flash cell for a single-level cell is one bit per one transistor so that the floating-gate NMOS NOR flash cell becomes designated as an n-bit/n transistor cell. In the multi-level cell the number bit is dependent on the number of threshold voltage levels being stored in each of the floating gate transistors 1010 a, 1010 b, . . . , 1010 n.

The current market requirements for the present technology of a NOR Flash memory device is that the read access time is between approximately 100 nS to approximately 20 μS. The number of transistors in the NAND based NOR flash memory cells determines the performance of the cell. For instance the two transistor floating-gate NMOS NOR flash cell in the embodiment of FIGS. 4 a, 4 b-1, 4 b-2, 4 c-1, and 4 c-2, the read access time is approximately 100 nS for NAND based NMOS NOR flash memory array having a capacity of from 1 Gb to 4 Gb. Alternately, a NAND based NMOS NOR flash memory array having a capacity of from 1 Mb to 4 Mb will have a read access time of from 20 ns to 50 ns. In the array, the read is a random access in the units of a Byte (8-bit), a Word (16-bit), or double-word (32-bit). The program unit is of a full page of 512 bytes or ½ page of 256-bytes. The erase unit size is performed in units of sectors (4K bytes for a small sector or 64K bytes for big sectors).

In other embodiments, the NAND based NMOS NOR flash memory cell has a serial string of 16 transistors or 32 transistors. With the longer strings the read access time decreases to approximately 20 μs for an array capacity from 1 Gb to 32 Gb. In this embodiment the read is a serial access in units of ½-page (256-bytes) or a full-page (512-bytes). Similarly, the program operation has a unit size of a full page of 512 bytes or ½ page of 256-bytes. The erase unit size is in the size of a sector 512 bytes×16 (8K bytes) or 512 bytes×32 (16K bytes).

In various embodiments, the NAND based floating-gate NMOS NOR flash memory cell may contain any number of transistors as described. However, to insure to that the performance is adequate to meet the current requirements floating-gate NMOS NOR flash memory cell, a preferential design employs up to 15 serial transistors in the string of the NAND based floating-gate NMOS NOR flash memory cell.

In the embodiments as described above, the NAND based NMOS NOR flash memory cell contains floating gate transistors for charge storage. It is in keeping is with the intent of this invention that the NAND based floating-gate NMOS NOR flash memory cell have SONOS charge trapping NAND transistors in each of the NAND strings of the NOR flash memory cell.

An integrated circuit device that includes arrays of NAND based flash memory cells may be constructed to have an array of NAND flash nonvolatile memory circuits and arrays of NAND based NMOS NOR flash memory cell that embody the concepts of the present invention. The arrays of the NAND based NMOS NOR flash memory cell may further be incorporated with volatile memory to form combinations of memory functions on a single integrated circuit die. Further, the NAND based NMOS NOR flash memory cell may have peripheral circuitry to enable the NAND based NMOS NOR flash memory cell to be used in an applications such as programmed logic devices (PLD) or field programmable gate arrays (FPGA).

While this invention has been particularly shown and described with reference to the preferred embodiments thereof, it will be understood by those skilled in the art that various changes in form and details may be made without departing from the spirit and scope of the invention. 

1. A NOR flash nonvolatile memory circuit comprising: a plurality of charge retaining transistors serially connected such that at least one of the plurality of charge retaining transistors functions as a select gate transistor to prevent leakage current through the plurality of charge retaining transistors when the plurality of charge retaining transistors is not selected for reading; wherein a drain of a topmost charge retaining transistor is connected to a bit line associated with and parallel to the plurality of serially connected charge retaining transistors; wherein a source of a bottommost charge retaining transistor is connected to a source line associated with the plurality of charge retaining transistors and parallel to the associated bit line; and wherein a control gate of each of the plurality of charge retaining transistors is connected to a word line.
 2. The NOR flash nonvolatile memory circuit of claim 1 wherein the plurality of charge retaining transistors are formed within a well of a first conductivity type.
 3. The NOR flash nonvolatile memory circuit of claim 2 wherein the well of the first conductivity type is formed within a deep well of a second conductivity type.
 4. The NOR flash nonvolatile memory circuit of claim 3 wherein the deep well of the second conductivity type is formed in a substrate of the first conductivity type-type.
 5. The NOR flash nonvolatile memory circuit of claim 1 wherein the plurality of charge retaining transistors are programmed and erased with a Fowler-Nordheim tunneling process.
 6. The NOR flash nonvolatile memory circuit of claim 1 wherein a selected charge retaining transistor of the plurality of charge retaining transistors is programmed as single-level program cell by applying a very high program voltage level of from approximately +15.0V to approximately +20.0V in incrementally increasing steps between the control gate of the selected charge retaining transistor and a bulk region of the charge retaining transistor.
 7. The NOR flash nonvolatile memory circuit of claim 6 wherein non-selected charge retaining transistors of the plurality of charge retaining transistors are inhibited by applying an intermediate program inhibit voltage level of less than 10.0V between the control gate of the non-selected charge retaining transistors and a bulk region of the non-selected charge retaining transistors.
 8. The NOR flash nonvolatile memory circuit of claim 1 wherein a layout of the NOR flash memory circuit is such that the size of the NOR flash memory circuit is of from approximately four times to approximately six times the minimum feature size (λ) of the process technology for fabricating the NOR flash memory circuit.
 9. The NOR flash nonvolatile memory circuit of claim 1 wherein the selected charge retaining transistor is erased by applying a very high positive erase voltage level of from approximately +15.0 v to approximately +20.0V between the bulk region of the selected charge retaining transistor and control gate of selected the charge retaining transistor.
 10. The NOR flash nonvolatile memory circuit of claim 1 wherein non-selected charge retaining transistors of the plurality of charge retaining transistors are inhibited by biasing the non-selected charge retaining transistors such that there is a approximately a 0.0V voltage level between the control gate and the bulk region of the non-selected storage transistors.
 11. The NOR flash nonvolatile memory circuit of claim 1 the selected charge retaining transistor of the plurality of charge retaining transistors that is programmed as a single-level program cell is read by: connecting the source line to a voltage follower sensing circuit; setting the gate and drain of the selected charge retaining transistors within the NOR flash memory circuit is set to a voltage level of a power supply voltage source; the gate of the non-selected charge retaining transistor within the plurality of charge retaining transistors is set to a first very high read voltage; and comparing a voltage developed at the source line in the voltage follower sensing circuit with reference voltage source, the reference voltage source is set to a reference voltage level of approximately 2.0V to distinguish between a threshold voltage level for a first logic level and a threshold voltage levels of a second logic level.
 12. The NOR flash nonvolatile memory circuit of claim 11 wherein the first very high read voltage is greater than 6.0V.
 13. The NOR flash nonvolatile memory circuit of claim 11 wherein the reference voltage level is approximately 2.0V.
 14. The NOR flash nonvolatile memory circuit of claim 11 wherein if the NOR flash nonvolatile memory circuit is not selected for reading when another NOR flash nonvolatile memory circuit is selected in an array NOR flash nonvolatile memory circuits, the control gates of the non-selected charge retaining transistors of the plurality of charge retaining transistors of non-selected NOR flash memory circuit is set to the ground reference voltage to turn off the charge retaining transistors.
 15. The NOR flash nonvolatile memory circuit of claim 1 wherein the selected charge retaining transistor of the plurality of charge retaining transistors that is programmed as a multi-level program cell is read by: connecting the source line to a voltage follower sensing circuit; setting the gate and drain of the selected charge retaining transistor to a moderately high voltage level; setting the gate of all non-selected charge retaining transistors within the plurality of charge retaining transistors to a second very high read voltage; and comparing a voltage developed at the source line in the voltage follower sensing circuit to a number of reference voltage levels to determine a threshold voltage representing data stored within the charge retaining transistor.
 16. The NOR flash nonvolatile memory circuit of claim 15 wherein the moderately high voltage level is approximately +4.0V.
 17. The NOR flash nonvolatile memory circuit of claim 15 where in the second very high read voltage is greater than 7.0V.
 18. The NOR flash nonvolatile memory circuit of claim 15 wherein the reference voltage levels are set to between each of the voltage threshold levels that distinguish between the threshold voltage levels for each datum stored in the charge retaining transistor.
 19. The NOR flash nonvolatile memory circuit of claim 15 wherein if the NOR flash nonvolatile memory circuit is not selected for reading when another NOR flash nonvolatile memory circuit is selected in an array NOR flash nonvolatile memory circuits, the control gates of the non-selected charge retaining transistors of the plurality of charge retaining transistors of non-selected NOR flash memory circuit is set to the ground reference voltage to turn off the charge retaining transistors.
 20. A NOR flash nonvolatile memory device comprising: an array of a plurality of NOR flash nonvolatile memory circuits arranged in rows and column, wherein each of the nonvolatile memory circuits comprise: a plurality of charge retaining transistors on each column are connected serially such that at least one of the plurality of charge retaining transistors functions as a select gate transistor to prevent leakage current through the plurality of charge retaining transistors when the plurality of charge retaining transistors is not selected for reading; wherein a drain of a topmost charge retaining transistor of each NOR flash memory circuit is connected to a local bit line associated with and parallel to the column on which each NOR flash memory circuit resides; wherein a source of a bottommost charge retaining transistor of each of the NOR flash memory circuits is connected to a local source line associated with the NOR flash memory circuit and parallel to the associated bit line; and wherein each control gate of the charge retaining transistors on each row are commonly connected to a word line.
 21. The NOR flash nonvolatile memory device of claim 20 further comprising a column voltage control circuit connected to provide control signals to local bit lines and the source lines associated with each of the columns of charge retaining transistors.
 22. The NOR flash nonvolatile memory device of claim 21 wherein each of the local bit lines is connected to one of a plurality of global bit lines through a bit line select transistor.
 23. The NOR flash nonvolatile memory device of claim 22 wherein each of the local source lines is connected to one of a plurality of global source lines through a source line select transistor.
 24. The NOR flash nonvolatile memory device of claim 23 wherein the global bit lines and the global source lines are connected to the column voltage control circuit to transfer the control signals to selected local bit lines and selected local source lines for reading, programming, and erasing selected charge retaining transistors within the NOR flash nonvolatile memory circuits.
 25. The NOR flash nonvolatile memory device of claim 20 further comprising a row voltage control circuit connected to provide control signals to word lines associated with each of the rows of charge retaining transistors.
 26. The NOR flash nonvolatile memory device of claim 25 wherein the row control circuit transfers the control signals to word lines for reading, programming, and erasing selected charge retaining transistors within the NOR flash nonvolatile memory circuits.
 27. The NOR flash nonvolatile memory device of claim 24 further comprising a bit line select control circuit connected the gates of the local bit line select transistors and the source line select transistors connected to each of the local bit lines.
 28. The NOR flash nonvolatile memory device of claim 20 wherein the row control circuit transfers word line control signals to word lines for reading, programming, and erasing selected charge retaining transistors within the NOR flash nonvolatile memory circuits and bit line select signals to the selected bit line select transistors and source line select signals to the selected source line transistors to transfer the bit line and source line control signals from the column voltage control circuit to the selected local bit lines and selected local source lines.
 29. The NOR flash nonvolatile memory device of claim 20 wherein the plurality of charge retaining transistors are programmed and erased with a Fowler-Nordheim tunneling process.
 30. The NOR flash nonvolatile memory device of claim 20 wherein a selected charge retaining transistor of the plurality of charge retaining transistors is programmed as single-level program cell by applying a very high program voltage level of from approximately +15.0V to approximately +20.0V in incrementally increasing steps between the control gate of the selected charge retaining transistor and a bulk region of the charge retaining transistor.
 31. The NOR flash nonvolatile memory device of claim 30 wherein non-selected charge retaining transistors of the plurality of charge retaining transistors are inhibited by applying an intermediate program inhibit voltage level of less than 10.0V between the control gate of the non-selected charge retaining transistors and a bulk region of the non-selected charge retaining transistors.
 32. The NOR flash nonvolatile memory device of claim 20 wherein a layout of the NOR flash memory circuit is such that the size of the NOR flash memory circuit is of from approximately four times to approximately six times the minimum feature size (A) of the process technology for fabricating the NOR flash memory circuit.
 33. The NOR flash nonvolatile memory device of claim 20 wherein the selected charge retaining transistor is erased by applying a very high negative erase voltage level of from approximately +15.0V to approximately +20.0V between the bulk region of the selected charge retaining transistor and control gate of the selected charge retaining transistor.
 34. The NOR flash nonvolatile memory device of claim 20 wherein non-selected charge retaining transistors of the plurality of charge retaining transistors are inhibited by biasing the non-selected charge retaining transistors such that there is a approximately a 0.0V voltage level between the control gate and the bulk region of the non-selected storage transistors.
 35. The NOR flash nonvolatile memory device of claim 20 wherein the selected charge retaining transistor of the plurality of charge retaining transistors that is programmed as a single-level program cell is read by: connecting the source line to a voltage follower sensing circuit; setting the gate and drain of the selected charge retaining transistors within the NOR flash memory circuit is set to a voltage level of a power supply voltage source; the gate of the non-selected charge retaining transistor within the plurality of charge retaining transistors is set to a first very high read voltage; and comparing a voltage developed at the source line in the voltage follower sensing circuit with reference voltage source, the reference voltage source is set to a reference voltage level of approximately 2.0V to distinguish between a threshold voltage level for a first logic level and a threshold voltage levels of a second logic level.
 36. The NOR flash nonvolatile memory device of claim 35 wherein the first very high read voltage is greater than 6.0V.
 37. The NOR flash nonvolatile memory device of claim 35 wherein the reference voltage level is approximately 2.0V.
 38. The NOR flash nonvolatile memory device of claim 35 wherein the word lines and thus the control gates of the non-selected charge retaining transistors of the plurality of charge retaining transistors of non-selected NOR flash memory circuit are set to the ground reference voltage to turn off the charge retaining transistors.
 39. The NOR flash nonvolatile memory device of claim 20 wherein the selected charge retaining transistor of the plurality of charge retaining transistors programmed as a multi-level program cell is read by: connecting the source line to a voltage follower sensing circuit; setting the gate and drain of the selected charge retaining transistor to a moderately high voltage level; setting the gate of all non-selected charge retaining transistors within the plurality of charge retaining transistors to a second very high read voltage and comparing a voltage developed at the source line in the voltage follower sensing circuit to a number of reference voltage levels to determine a threshold voltage representing data stored within the charge retaining transistor.
 40. The NOR flash nonvolatile memory device of claim 39 wherein the moderately high voltage level is approximately +4.0V.
 41. The NOR flash nonvolatile memory device of claim 39 where in the second very high read voltage is greater than 7.0V.
 42. The NOR flash nonvolatile memory device of claim 39 wherein the reference voltage levels are set to between each of the voltage threshold levels that distinguish between the threshold voltage levels for each datum stored in the charge retaining transistor.
 43. The NOR flash nonvolatile memory device of claim 39 wherein the word lines and thus the control gates of the non-selected charge retaining transistors of the plurality of charge retaining transistors of non-selected NOR flash memory circuit are set to the ground reference voltage to turn off the charge retaining transistors.
 44. A method for forming a NOR flash nonvolatile memory device comprises the steps of: providing a substrate; and forming an array of a plurality of NOR flash nonvolatile memory circuits configured in rows and columns, wherein for the NOR flash nonvolatile memory circuits are formed by the steps of: forming a plurality of charge retaining transistors such that the charge retaining transistors are placed the rows and columns, connecting the plurality of charge retaining transistors on a column serially such that at least one of the plurality of charge retaining transistors functions as a select gate transistor to prevent leakage current through the plurality of charge retaining transistors when the plurality of charge retaining transistors is not selected for reading, connecting a drain of a topmost charge retaining transistor of each NOR flash memory circuit to a local bit line associated with and parallel to the column on which each NOR flash memory circuit resides, connecting a source of a bottommost charge retaining transistor of each of the NOR flash memory circuits to a local source line associated with the NOR flash memory circuit and parallel to the associated bit line, and connecting each control gate of the charge retaining transistors-on each row are commonly to a word line.
 45. The method for forming a NOR flash nonvolatile memory device of claim 44 wherein a layout of the NOR flash memory circuit is such that the size of the NOR flash memory circuit is of from approximately four times to approximately six times the minimum feature size (λ) of the process technology for fabricating the NOR flash memory circuit.
 46. The method for forming a NOR flash nonvolatile memory device of claim 44 further comprises the steps of: forming a column voltage control circuit; and connecting the column voltage control circuit to provide control signals to local bit lines and the source lines associated with each of the columns of charge retaining transistors.
 47. The method for forming a NOR flash nonvolatile memory device of claim 46 further comprising the comprising the step of connecting each of the local bit lines to one of a plurality of global bit lines through a bit line select transistor.
 48. The method for forming a NOR flash nonvolatile memory device of claim 44 further comprising the step of connecting each of the local source lines to one of a plurality of global source lines through a source line select transistor.
 49. The method for forming a NOR flash nonvolatile memory device of claim 44 further comprising the step of connecting the global bit lines and the global source lines to the column voltage control circuit to transfer the control signals to selected local bit lines and selected local source lines for reading, programming, and erasing selected charge retaining transistors within the NOR flash nonvolatile memory circuits.
 50. The method for forming a NOR flash nonvolatile memory device of claim 44 further comprises the step of forming a row voltage control circuit.
 51. The method for forming a NOR flash nonvolatile memory device of claim 50 further comprising connecting the row voltage control circuit to provide control signals to word lines associated with each of the rows of charge retaining transistors.
 52. The method for forming a NOR flash nonvolatile memory device of claim 50 further comprising connecting the gates of the local bit line select transistors and the source line select transistors connected to each of the local bit lines.
 53. The method for forming a NOR flash nonvolatile memory device of claim 52 further comprising transferring from the row control circuit the control signals to word lines for reading, programming, and erasing selected charge retaining transistors within the NOR flash nonvolatile memory circuits.
 54. The method for forming a NOR flash nonvolatile memory device of claim 53 further comprising transferring from the row voltage control circuit the select control signals to the selected bit line select transistors and the selected source line transistors to transfer the bit line and source line control signals from the column voltage control circuit to the selected local bit lines and selected local source lines.
 55. The method for forming a NOR flash nonvolatile memory device of claim 44 wherein the plurality of charge retaining transistors are programmed and erased with a Fowler-Nordheim tunneling process.
 56. The method for forming a NOR flash nonvolatile memory device of claim 44 wherein a selected charge-retaining transistor of the plurality of charge retaining transistors is programmed as single-level program cell by applying a very high program voltage level of from approximately +15.0V to approximately +20.0V in incrementally increasing steps between the control gate of the selected charge retaining transistor and a bulk region of the charge retaining transistor.
 57. The method for forming a NOR flash nonvolatile memory device of claim 44 wherein non-selected charge retaining transistors of the plurality of charge retaining transistors are inhibited by applying an intermediate program inhibit voltage level of less than 10.0V between the control gate of the non-selected charge retaining transistors and a bulk region of the non-selected charge retaining transistors.
 58. The method for forming a NOR flash nonvolatile memory device of claim 44 wherein the selected charge retaining transistor is erased by applying a very high negative erase voltage level of from approximately +15.0V to approximately +20.0V between the bulk region of the selected charge retaining transistor and control gate of the selected charge retaining transistor.
 59. The method for forming a NOR flash nonvolatile memory device of claim 44 wherein non-selected charge retaining transistors of the plurality of charge retaining transistors are inhibited by biasing the non-selected charge retaining transistors such that there is a approximately a 0.0V voltage level between the control gate and the bulk region of the non-selected storage transistors.
 60. The method for forming a NOR flash nonvolatile memory device of claim 44 the selected charge retaining transistor of the plurality of charge retaining transistors that is programmed as a single-level program cell is read by: connecting the source line to a voltage follower sensing circuit; setting the gate and drain of the selected charge retaining transistors within the NOR flash memory circuit is set to a voltage level of a power supply voltage source; the gate of the non-selected charge retaining transistor within the plurality of charge retaining transistors is set to a first very high read voltage; and comparing a voltage developed at the source line in the voltage follower sensing circuit with reference voltage source. The reference voltage source is set to a reference voltage level of approximately 2.0V to distinguish between a threshold voltage level for a first logic level and a threshold voltage levels of a second logic level.
 61. The method for forming a NOR flash nonvolatile memory device of claim 60 wherein the first very high read voltage is greater than 6.0V.
 62. The method for forming a NOR flash nonvolatile memory device of claim 60 wherein the reference voltage level is approximately 2.0V.
 63. The method for forming a NOR flash nonvolatile memory device of claim 60 wherein the word lines and thus the control gates of the non-selected charge retaining transistors of the plurality of charge retaining transistors of non-selected NOR flash memory circuit are set to the ground reference voltage to turn off the charge retaining transistors.
 64. The method for forming a NOR flash nonvolatile memory device of claim 44 wherein the selected charge retaining transistor of the plurality of charge retaining transistors that is programmed as a multi-level program cell is read by: connecting the source line to a voltage follower sensing circuit; setting the gate and drain of the selected charge retaining transistor to a moderately high voltage level; setting the gate of all non-selected charge retaining transistors within the plurality of charge retaining transistors to a second very high read voltage; and comparing a voltage developed at the source line in the voltage follower sensing circuit to a number of reference voltage levels to determine a threshold voltage representing data stored within the charge retaining transistor.
 65. The method for forming a NOR flash nonvolatile memory device of claim 64 wherein the moderately high voltage level is approximately +4.0V.
 66. The method for forming a NOR flash nonvolatile memory device of claim 64 where in the second very high read voltage is greater than 7.0V.
 67. The method for forming a NOR flash nonvolatile memory device of claim 64 wherein the reference voltage levels are set to between each of the voltage threshold levels that distinguish between the threshold voltage levels for each datum stored in the charge retaining transistor.
 68. The method for forming a NOR flash nonvolatile memory device of claim 64 wherein the word lines and thus the control gates of the non-selected charge retaining transistors of the plurality of charge retaining transistors of non-selected NOR flash memory circuit are set to the ground reference voltage to turn off the charge retaining transistors.
 69. An integrated circuit device comprising: an array of NAND flash nonvolatile memory circuits, each of the NAND flash nonvolatile memory circuit comprising: a plurality of charge retaining transistors arranged in rows and columns wherein said charge retaining transistors on each column form at least one grouping of charge retaining transistors that is arranged in a NAND series string of charge retaining transistors, each NAND series string having a top select transistor and a bottom select transistor; and an array of a plurality of NOR flash nonvolatile memory circuits, wherein each of the nonvolatile memory circuits comprise: a plurality of charge retaining transistors arranged in rows and column wherein the charge retaining transistors on each column are organized into at least one grouping and each grouping of the charge retaining transistors are connected serially such that at least one of the plurality of charge retaining transistors functions as a select gate transistor to prevent leakage current through the plurality of charge retaining transistors when the plurality of charge retaining transistors is not selected for reading; wherein a drain of a topmost charge retaining transistor of each NOR flash memory circuit is connected to a local bit line associated with and parallel to the column on which each NOR flash memory circuit resides; wherein a source of a bottommost charge retaining transistor of each of the NOR flash memory circuits is connected to a local source line associated with the associated NOR flash memory circuit and parallel with the associated bit line; and wherein each control gate of the charge retaining transistors on each row are commonly connected to a word line.
 70. The integrated circuit device of claim 69 wherein each of the NOR flash nonvolatile memory circuits further comprise a column voltage control circuit connected to provide control signals to local bit lines and the source lines associated with each of the columns of charge retaining transistors.
 71. The integrated circuit device of claim 69 wherein in each of the NOR flash nonvolatile memory circuits, the local bit lines is connected to one of a plurality of global bit lines through a bit line select transistor.
 72. The integrated circuit device of claim 71 wherein in each of the NOR flash nonvolatile memory circuits, the local source lines is connected to one of a plurality of global source lines through a source line select transistor.
 73. The integrated circuit device of claim 72 wherein in each of the NOR flash nonvolatile memory circuits, the global bit lines and the global source lines are connected to the column voltage control circuit to transfer the control signals to selected local bit lines and selected local source lines for reading, programming, and erasing selected charge retaining transistors within the NOR flash nonvolatile memory circuits.
 74. The integrated circuit device of claim 71 wherein each of the NOR flash nonvolatile memory circuits further comprises a row voltage control circuit connected to provide control signals to word lines associated with each of the rows of charge retaining transistors.
 75. The integrated circuit device of claim 74 wherein in each of the NOR flash nonvolatile memory circuits, the row control circuit transfers the control signals to word lines for reading, programming, and erasing selected charge retaining transistors within the NOR flash nonvolatile memory circuits.
 76. The integrated circuit device of claim 75 wherein in each of the NOR flash nonvolatile memory-circuits further comprises a bit line select control circuit connected the gates of the local bit line select transistors and the source line select transistors connected to each of the local bit lines.
 77. The integrated circuit device of claim 69 wherein in each of the NOR flash nonvolatile memory circuits, the row control circuit transfers word line control signals to word lines for reading, programming, and erasing selected charge retaining transistors within the NOR flash nonvolatile memory circuits and bit line select signals to the selected bit line select transistors and source line select signals to the selected source line transistors to transfer the bit line and source line control signals from the column voltage control circuit to the selected local bit lines and selected local source lines.
 78. The integrated circuit device of claim 69 wherein in each of the NOR flash nonvolatile memory circuits, the plurality of charge retaining transistors are programmed and erased with a Fowler-Nordheim tunneling process.
 79. The integrated circuit device of claim 69 wherein in each of the NOR flash nonvolatile memory circuits, a selected charge retaining transistor of the plurality of charge retaining transistors is programmed as single-level program cell by applying a very high program voltage level of from approximately +15.0V to approximately +20.0V in incrementally increasing steps between the control gate of the selected charge retaining transistor and a bulk region of the charge retaining transistor.
 80. The integrated circuit device of claim 79 wherein in each of the NOR flash nonvolatile memory circuits, non-selected charge retaining transistors of the plurality of charge retaining transistors are inhibited by applying an intermediate program inhibit voltage level of less than 10.0V between the control gate of the non-selected charge retaining transistors and a bulk region of the non-selected charge retaining transistors.
 81. The integrated circuit device of claim 69 wherein in each of the NOR flash nonvolatile memory circuits, a layout of the NOR flash memory circuit is such that the size of the NOR flash memory circuit is of from approximately four times to approximately six times the minimum feature size (A) of the process technology for fabricating the NOR flash memory circuit.
 82. The integrated circuit device of claim 69 wherein in each of the NOR flash nonvolatile memory circuits, the selected charge retaining transistor is erased by applying a very high negative erase voltage level of from approximately +15.0V to approximately +20.0V between bulk region of the selected charge retaining transistor and control gate of the selected charge retaining transistor.
 83. The integrated circuit device of claim 69 wherein in each of the NOR flash nonvolatile memory circuits, non-selected charge retaining transistors of the plurality of charge retaining transistors are inhibited by biasing the non-selected charge retaining transistors such that there is a approximately a 0.0V voltage level between the control gate and the bulk region of the non-selected storage transistors.
 84. The integrated circuit device of claim 69 wherein in each of the NOR flash nonvolatile memory circuits, the selected charge retaining transistor of the plurality of charge retaining transistors that is programmed as a single-level program cell is read by: connecting the source line to a voltage follower sensing circuit; setting the gate and drain of the selected charge retaining transistors within the NOR flash memory circuit is set to a voltage level of a power supply voltage source; the gate of the non-selected charge retaining transistor within the plurality of charge retaining transistors is set to a first very high read voltage; and comparing a voltage developed at the source line in the voltage follower sensing circuit with reference voltage source, the reference voltage source is set to a reference voltage level of approximately 2.0V to distinguish between a threshold voltage level for a first logic level and a threshold voltage levels of a second logic level.
 85. The integrated circuit device of claim 84 wherein in each of the NOR flash nonvolatile memory circuits, the first very high read voltage is greater than 6.0V.
 86. The integrated circuit device of claim 84 wherein in each of the NOR flash nonvolatile memory circuits, the reference voltage level is approximately 2.0V.
 87. The integrated circuit device of claim 84 wherein the word lines and thus the control gates of the non-selected charge retaining transistors of the plurality of charge retaining transistors of non-selected NOR flash memory circuit are set to the ground reference voltage to turn off the charge retaining transistors.
 88. The integrated circuit device of claim 69 wherein in each of the NOR flash nonvolatile memory circuits, the selected charge retaining transistor of the plurality of charge retaining transistors programmed as a multi-level program cell is read by: connecting the source line to a voltage follower sensing circuit; setting the gate and drain of the selected charge retaining transistor to a moderately high voltage level; setting the gate of all non-selected charge retaining transistors within the plurality of charge retaining transistors to a second very high read voltage and comparing a voltage developed at the source line in the voltage follower sensing circuit to a number of reference voltage levels to determine a threshold voltage representing data stored within the charge retaining transistor.
 89. The integrated circuit device of claim 88 wherein in each of the NOR flash nonvolatile memory circuits, the moderately high voltage level is approximately +4.0V.
 90. The integrated circuit device of claim 88 wherein in each of the NOR flash nonvolatile memory circuits, the second very high read voltage is greater than 7.0V.
 91. The integrated circuit device of claim 88 wherein in each of the NOR flash nonvolatile memory circuits, the reference voltage levels are set to between each of the voltage threshold levels that distinguish between the threshold voltage levels for each datum stored in the charge retaining transistor.
 92. The integrated circuit device of claim 88 wherein the word lines and thus the control gates of the non-selected charge retaining transistors of the plurality of charge retaining transistors of non-selected NOR flash memory circuit are set to the ground reference voltage to turn off the charge retaining transistors. 